Used Gencoa Planar Magnetron Cathode

Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

CPA V2000 Five Target RF and DC Magnetron In Line Sputtering System. Currently configured for single sided sputtering but cathodes can be moved manually if double sided sputtering is desired. Target Size: 3-1/2 in. x 18 in. Easy access to cathodes via hinged doors. Currently configured with 4 DC and 1 RF cathodes. Multiple CTI cryopumps for high vacuum. Load lock chambers on both ends. Loader handles up to 28 20 in. H panels or pallets. Variable speed pallet transport system. Tested: $119,000. As Is Untested: $69,000.

Denton Vacuum Explorer 14 DC Sputtering System. Chamber: 12 in. dia. x 18 in. H glass Pyrex bell jar with guard. 15-inch dia. baseplate/pumping plenum assembly supported by system cabinet. System mounted on casters. Pumping System: Turbomolecular pump, LN2 trap located beneath high vacuum poppet valve and manual fill via external funnel. Alcatel 2010 two stage, rotary vane pump. Sputter Source: (1) DSM-300A cold sputter module. 300W DC power supply, 4-inch dia. magnetron sputter source with Denton Vacuum patented ANODE GRID® for maximum electron capture and minimal specimen heating. Variable source to substrate distance. Substrate Fixturing: 8.0 in. Omni rotating fixture plate, speed adjusts via input to system touch screen. Air operated shutter. Control System: The Explorer 14 system is semiautomatic and is controlled by a DL205 CPU from Automationdirect. The operator interface is a touch panel with graphical interface to the PLC. Graphical interface is supported with Automationdirect software. Manual operation of valves, pumps, low voltage sources and fixture rotation subsystems is through this graphical interface. Semiautomatic processes are also operated through this interface.

Edwards S150B Cool Sputter Coater for SEM Samples. Easy to use full instrumentation. Adjustable target to work table distance. No gold target with system. Built in vacuum pump. 110V, 60 Hz, 8A.

Bio-Rad E6100 Benchtop Vacuum Coater for TEM/SEM Sputter Coater and Carbon Coater. Currently configured sputtering source (ring type) and carbon coating source. E5350 power supply. 12 in. x 12in. bell jar with implosion guard. 110V, 60 Hz.

Kurt J. Lesker CMS-18 Six Target Load Locked RF DC Sputtering System. Dual chamber with load lock. Three cathodes in each chamber for total of six cathodes. PLC Process control (programmable depositions). Substrates up to 8 in. dia. Substrate rotation. Substrate bias, RF and DC. Substrate heater up to 500 deg C. 3-inch Magnetron sputter cathodes. Process Gases: Ar, O2, N2. RF and DC power supplies. CALL FOR PRICE.

NOT RECENT PHOTO MISSING RFX-600, ATX-600 AND TWO TURBO CONTROLLERS

Anatech Hummer 6.2 SEM Sample Sputter Coater. Magnetically enhanced sputter head minimizes sample heating. Automatic slow venting at power down. Sample stage accommodates up to a 3 in. dia. substrate or SEM stubs. Self-contained two stage vacuum pump. Does not come with gold target. 120V, 60 Hz. FULLY TESTED AND READY TO SHIP!

Denton Vacuum Desk IV Standard Sputter Coater for SEM Samples. Provides a uniform, conductive, fine grained coating. Self-contained unit with built-in pump. Advanced design magnetron sputterhead for truly cold sputtering. Etch mode for sample cleaning. 6 in. OD pyrex chamber. Sputters precious metals, no target included. Does not require gas. 120V, 50/60 Hz, 10A.