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Cleaning Systems

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Used EDC 100

Inventory Number: 51023
Now (USD): $2,500.00

EDC 100 Exclusive Design Co. Rigid Disk Cleaning System. Uses brushes and surfactant to scrub disks. LCD display. Analog control of scrub/rinse speed and spin dry speed. 115V, 60 Hz.

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Used UVOCS T10X10/OES

Inventory Number: 64542
Now (USD): $4,500.00

UVOCS T10X10-OES Ultra Violet Ozone Cleaning System. UV/Ozone cleaning process provides a simple, inexpensive, fast method of obtaining ultra-clean surfaces free of organic contaminants on most inorganic surfaces, such as quartz, silicon, gold, nickel, aluminum, gallium, arsenide, alumina†, etc.  The process is ideal when thin film deposition with excellent adhesion to the substrate is required.  Ultra-clean surfaces can easily be achieved by UV/Ozone processing in one to several minutes after the substrate has been cleaned by conventional techniques. Active Area: 100” squared. Sliding parts tray height to 1.5”. Lamp units 245nm UV. Digital controller. 115V, 60 Hz, 2.5A

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Used UVP PR-100

Inventory Number: 64544
Now (USD): $1,500.00

UVP PR-100 Ozone Surface Cleaner A photochemical interaction occurs in an atmosphere of ultraviolet radiation and ambient air that generates ozone. As the molecules of an organic contaminant become active under ultraviolet radiation they dissociate. The organic contaminants then decompose into harmless volatile gases such as carbon dioxide. The PR-100 produces surfaces meticulously free of contamination. Chamber: 111/8” x 11 5/8” x 3 1/8”.

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Used STI 870

Inventory Number: 64582
Now (USD): $8,500.00

Semitool STI 870 Spin Rinser Dryer Double Stack. 6” Wafer Rotor in the top spinner and a 4" Rotor in the bottom spinner. High performance cleaning, rinsing and drying system for 25 wafer batch cassette. This system is capable of cleaning substrates from 2” to 6” round if the correct Rotor is installed for that wafer size. On axis orientation keeps wafers parallel allowing DI water manifolds to spray both sides of product continuously and simultaneously. Built in resistivity monitor. 120V, 50/60 Hz,

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Used STI ST-260

Inventory Number: 64585
Now (USD): $2,950.00

Semitool STI ST 260 Spin Rinser Dryer. High performance cleaning, rinsing and drying system for 25 wafer batch cassette. Currently configured with Rotor for 2” wafers. This system is capable of cleaning substrates from 2” to 5” round if the correct Rotor is installed for that wafer size. On axis orientation keeps wafers parallel allowing DI water manifolds to spray both sides of product continuously and simultaneously. Built in resistivity monitor. 120V, 50/60 Hz,

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