Used STI 870

Norcal 3870-01160 Ion Tube Isolation Valve. KF-25 flange.

Norcal 3870-01162 Valve. Air operated. KF-50.

Norcal 3870-01161 Valve. KF25.

EDC 100 Exclusive Design Co. Rigid Disk Cleaning System. Uses brushes and surfactant to scrub disks. LCD display. Analog control of scrub/rinse speed and spin dry speed. 115V, 60 Hz.

UVOCS T10X10-OES Ultra Violet Ozone Cleaning System. UV/Ozone cleaning process provides a simple, inexpensive, fast method of obtaining ultra-clean surfaces free of organic contaminants on most inorganic surfaces, such as quartz, silicon, gold, nickel, aluminum, gallium, arsenide, alumina†, etc.  The process is ideal when thin film deposition with excellent adhesion to the substrate is required.  Ultra-clean surfaces can easily be achieved by UV/Ozone processing in one to several minutes after the substrate has been cleaned by conventional techniques. Active Area: 100” squared. Sliding parts tray height to 1.5”. Lamp units 245nm UV. Digital controller. 115V, 60 Hz, 2.5A

UVP PR-100 Ozone Surface Cleaner A photochemical interaction occurs in an atmosphere of ultraviolet radiation and ambient air that generates ozone. As the molecules of an organic contaminant become active under ultraviolet radiation they dissociate. The organic contaminants then decompose into harmless volatile gases such as carbon dioxide. The PR-100 produces surfaces meticulously free of contamination. Chamber: 111/8” x 11 5/8” x 3 1/8”.

Semitool STI ST 260 Spin Rinser Dryer. High performance cleaning, rinsing and drying system for 25 wafer batch cassette. Currently configured with Rotor for 2” wafers. This system is capable of cleaning substrates from 2” to 5” round if the correct Rotor is installed for that wafer size. On axis orientation keeps wafers parallel allowing DI water manifolds to spray both sides of product continuously and simultaneously. Built in resistivity monitor. 120V, 50/60 Hz,

UVOCS T16X16/OES Ultraviolet Ozone Cleaning System. Cleaning or oxidation with the UVOCS is accomplished by the combination of ultraviolet light and ozone.  Low pressure quartz-mercury vapor lamp which generates UV emissions in the 254 and 185 nanometer range.  Source Size: 16” x 16”. Active Area: 256 sq. in. Width: 20”. Depth: 29¾”. Height: 14½ ”. 110 V, 60 Hz, 5.0A

Branson Ultrasonics B950R Automatic Ultrasonic Vapor Degreaser. Branson B950R Ultrasonic Vapor Degreaser is the latest in a series of environmentally sound, cost effective precision degreasers. The B-Series is designed to comply with EPA environmental regulations on solvent emissions, an important environmental and economic consideration.

Semitool STI ST 260 Spin Rinser Dryer. High performance cleaning, rinsing and drying system for 25 wafer batch cassette. Currently configured with Rotor for 2” wafers. This system is capable of cleaning substrates from 2” to 5” round if the correct Rotor is installed for that wafer size. On axis orientation keeps wafers parallel allowing DI water manifolds to spray both sides of product continuously and simultaneously. Built in resistivity monitor. 120V, 50/60 Hz,