Photoresist: Coaters - Tracks

Laurell WS-500-8TFM WS-500 Series Spin Processor Developing Station for up to 200mm Wafers. For cleaning, etching, developing processes on wafers up to 200mm. Features a locked, counter balanced, clear dome chamber for a protected view of the process without exposure to vapors or chemicals. Up to 20 fifty step programs can be stored in the controller. 120V, 60 Hz. UNIT HAS BEEN TESTED AND IS READY TO GO.