Photoresist: Coaters - Tracks

Parylene Deposition System. Computer controlled parylene coating system. Includes thickness monitor. Menu driven operation. Temperature is a key process parameter. There are three temperature zones in the system. The electrical components have been installed to allow addition of a fourth zone should it be required in the future. The three zones are the Sublimation, Pyrolysis and the Vacuum Gauge plumbing. The Sublimation oven uses a heater of about 850W at 120 VAC. The thermocouple is buried in the oven insulation and should not contact the glass sublimation tube. It is heated to between 80 and 130 deg C. The Pyrolysis oven uses a 2200W 208 VAC heater. The pyrolysis oven is factory set to 650 deg C. The thermocouple is mounted from the top and extends down into the insulation. The vacuum gauge plumbing heater is rated at 420W 120 VAC. The heater is factory set to 150 deg C. Heating the plumbing to 150 deg C prevents the deposition of parylene in the plumbing and on the sensing element of the pressure gauge. The deposition chamber is where the monomer created in the pyrolysis oven is deposited as a polymer. It contains the rack, which holds the parts to be coated. Chamber is 16 in. dia. x 17 in. D. System requires LN2 for cold trap. 208V, 3 Ph, 60 Hz, 20A.

Parylene Deposition System. Computer controlled parylene coating system. Includes thickness monitor. Menu driven operation. Temperature is a key process parameter. There are three temperature zones in the system. The electrical components have been installed to allow addition of a fourth zone should it be required in the future. The three zones are the Sublimation, Pyrolysis and the Vacuum Gauge plumbing. The Sublimation oven uses a heater of about 850W at 120 VAC. The thermocouple is buried in the oven insulation and should not contact the glass sublimation tube. It is heated to between 80 and 130 deg C. The Pyrolysis oven uses a 2200W 208 VAC heater. The pyrolysis oven is factory set to 650 deg C. The thermocouple is mounted from the top and extends down into the insulation. The vacuum gauge plumbing heater is rated at 420W 120 VAC. The heater is factory set to 150 deg C. Heating the plumbing to 150 deg C prevents the deposition of parylene in the plumbing and on the sensing element of the pressure gauge. The deposition chamber is where the monomer created in the pyrolysis oven is deposited as a polymer. It contains the rack, which holds the parts to be coated. Chamber is 16 in. dia. x 17 in. D. System requires LN2 for cold trap. 208V, 3 Ph, 60 Hz, 20A.

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR CEE SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Benchtop Spin Coater and Hot Plate. Maximum substrate size: 200mm round or 6 in. x 6 in. sq. Fully programmable with multi-step processing. Controlled spin environment for ultra high uniformity film thickness. Spin speed: 0 to 6000 rpm. Acceleration: 1 to 30,000 rpm/sec. Hot plate temp. range: 50 to 300 deg C. Hot chuck size: 10 in. x 10 in.

Cassette to Cassette Photoresist Developer Track with Hot Plate Bake and Chill. System was used in research environment to process 6 in. sq. substrates. Consists of two elevator units, one teflon bowl with four dispense valves, one hot plate bake unit and one cool plate. The spinner parameters are programmable via multiline control panel. The hot plate temperature range is 50 deg C to +300 deg C and is programmable. Vacuum contact, proximity and gravity contact.

Cassette to Cassette Photoresist Spinner with Hot Plate Bake and Cool. Fully programmable automated coat/bake track system. Currently configured for 6 in. squares. Spinner with backside rinse. Max. Spin Speed: 6000 rpm. Programmable acceleration control from 1 to 30,000 rpm/sec. Storage of 10 recipes with up to 10 steps/recipes. Hot Plate Max. Temp.: 300 deg C. Programmable proximity, gravity contact and vacuum contact. Cooling plate.

Photoresist Spin Coater and Hot Plate Combination Tool. Features the accuracy and repeatability needed to eliminate processing variability from photoresist and thin film deposition processes. User friendly interface touch screen with expanded multi-level programming. Can accommodate substrates up to 200mm round or 7 in. square. 115V, 50/60 Hz, 15A.

Large Substrate Precision Spin Coater. Precision photoresist spin coater delivers track quality performance in an efficient space saving design. Touch screen interface and display. Acceleration: 0 to 20,000 rpm/sec. Spin speed programmable up to 6,000 rpm. Can be configured for substrates up to 450mm dia., ask salesperson about available chuck. 208-230V, 1 Ph, 50/60 Hz, 4.2A, CE.

Photoresist Spin Coater and Hot Plate Combination Tool. Features the accuracy and repeatability needed to eliminate processing variability from photoresist and thin film deposition processes. User friendly touch screen with expanded multi-level programming. Can accommodate substrates up to 200 mm round or 7 in. sq. 110-125V, 50/60 Hz, 15.9A, CE.

Extrusion Coating System. Uses high precision extrusion technology to coat materials in a wide range of viscosities. Coats very thick layers (100 micrometers) in a single step. Repeatable digitally programmed process. Greater material utilization than spin coating (typical 75 percent of dispensed material remains on the wafer).

Cassette to Cassette Extrusion Coating System with Stacked Bake/Chill Oven. System is capable of coatings over 100 micron thick in one process step with uniformities surpassing +/- 2 percent. Material utilization is 75 percent compared to 5-10 percent for spin coating. This means lower cost of material and reduced expense of waste disposal. Increased process uniformity. Uses high precision extrusion technology. Ability to coat materials in a wide range of viscosities. Repeatable digitally programmed process. With Genmark Mini Max Gencobot 7S/3L Handler. Model JS-9940 stacked bake unit with 3 ovens.