Developers - Wet Process

SEZ Semiconductor Equipment MCM 203 Single Wafer Wet Chemical Spin Processor. Single wafer spin processor for yield improvement in wafer surface preparation. Manual loading and unloading of wafers, does not have cassette option. Used in semiconductor production and R&D applications of wafers to 200mm dia. Graphical user interface, PC controller. A maximum of sixteen process steps can be defined within one process file. Heat exchanger for controlling chemical temperature. Single process chemical tank. 208V, 50/60 Hz, 13A.

SSEC 3302 Single Wafer Chemical Etch Processor. Two wafer processing modules, acid processing. Stainless steel construction. Two wafer elevators. PC controller. 220V, 3 Ph, 60 Hz, 30A, CE. Sold Untested.

Imtec QRT/S-A2001/12 Heated Quartz Cascade Overflow Bath. Model 10-000-0441. Bath Dimensions 11"L X 12"W X 11"D. 208/240V, 1PH, 50/60Hz, 4330Watts.