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Plasma Etchers - Ashers - Ion Mills

Used Trion Technology Minilock

Inventory Number: 56453
Now (USD): $2,999.00

Trion Technology Minilock Single Wafer RIE Etcher. LCD display. Load lock with transfer arm. Current substrate carrier for up to 150mm wafers. Five MFC for gas input. Missing RF generator and vacuum pump. Sold As Is.

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Used March Instruments PX 1000E8

Inventory Number: 58786
Now (USD): $21,500.00

March Instruments PX 1000E8 Plasma Asher/Etcher with Pneumatic Vertical Door. Batch system for plasma cleaning or etching. Currently configured with vertical shelves: 18 in. x 6 in. RFX 600 13.56 MHz RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.

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Used Oxford Instruments 90 Plus RIE

Inventory Number: 62737
Now (USD): $19,500.00

Oxford Instruments 90 Plus RIE Reactive Etcher with Loadlock. Small batch load-locked RIE with 275 mm electrode. Easy to use computer interface controls all system functions. 13.56 MHz RF generator, 600W. Gas box with four MFC. Previous gases used: Oxygen, Boron Trichloride, Chlorine and Nitrogen. SYSTEM SOLD AS IS WHERE IS, ONLY WHAT IS IN THE PHOTOS.

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Used Anatech SP100

Inventory Number: 62871
Now (USD): $9,500.00

Anatech SP100 Table Top Plasma System. For plasma cleaning of small parts or for modifying surfaces. Digital countdown timer. Analog pressure display. Gas flow with needle valve control. RF Power Source: 100W at 13.56 MHz. Quartz Chamber: 4 in. x 8 in. Includes vacuum pump. 110V, 60 Hz, 10A.

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Used Plasmatherm SLR 770 ICP PLASMA ETCH SYSTEM

Inventory Number: 62603
Now (USD): $185,000.00

Plasmatherm SLR-770 ICP Shuttle Lock ICP Inductively Coupled Plasma Etch System. PC controller. Vacuum load lock with wafer transfer robot. Can process wafers from 2” to 8” depending on which process kit is installed. Currently configured with 3” kit. Thermal transfer module for effective cooling of substrate utilizing helium backside thermal transfer in conjunction with computer controlled substrate clamping. High frequency RF-based inductively coupled plasma source capable of high density plasma generation. Closed loop pressure control. Turbo pump with roughing pump. Total of eight MFC gas controllers. Previous gases used N2, O2, CHF3, AR, CH4, CL2, BCL3, CF4. Includes water chiller.

Product Details

Used Oxford Instruments Plasmalab 800 Plus PECVD

Inventory Number: 63975
Now (USD): $75,000.00

Oxford Plasmalab 800 Plus PECVD Plasma Deposition System

  • Plasma Enhanced Chemical Vapor Deposition 
  • Automatic pressure control
  • Substrate electrode: 460mm with PID control
  • Can process wafer pieces
  • Shower head gas inlet optimized for PECVD
  • 400° C substrate table
  • System Computer
  • PC control with OPT software under Windows
  • System software controls all aspects of machine functionality and control of the process operation
  • Production mode: system will perform the following sequence without any operator intervention: chamber pumping, recipe running, chamber venting
  • Process chamber includes a window panel giving a view on the process table
  • System Chiller
  • Edwards IHX 610 Vacuum Pump
  • Advanced Energy LF-5 RF Generator
  • Power: 208VAC, 3PH, 50/60 HZ
  • Gas Box with MKS MFCs consisting of:
  • 1)  Gas: CF4
  • 2)  Gas: N2
  • 3)  Gas: N2O
  • 4)  Gas: SiH4
  • 5)  Gas: N2
  • 6)  Gas: O2 

Product Details