Inventory Number: 56694
Retail (USD):
$2,500.00
Now (USD):
$2,500.00
Gencoa Planar Magnetron Cathode. Target Area: 29-1/2 in. x 4-7/8 in. Gas input. With cart for maintenance of cathode.
Product Details
Inventory Number: 56692
Retail (USD):
$2,500.00
Now (USD):
$2,500.00
Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.
Product Details
Inventory Number: 56693
Retail (USD):
$2,500.00
Now (USD):
$2,500.00
Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.
Product Details
Inventory Number: 64689
Retail (USD):
$5,250.00
Now (USD):
$5,250.00
Denton Vacuum Desk IV Standard Sputter Coater for SEM Samples. Provides a uniform, conductive, fine grained coating. Self-contained unit with built-in pump. Advanced design magnetron sputterhead for truly cold sputtering. Etch mode for sample cleaning. 6” OD pyrex chamber. Sputters precious metals, no target included. Does not require gas. 120V, 50/60 Hz, 10A
Product Details
Inventory Number: 64722
Retail (USD):
$950.00
Now (USD):
$950.00
Denton Vacuum Carbon Evaporation Accessory. For depositing an even conductive coating on samples for X-ray analysis. Comes with power supply, 6" x 9" Pyrex cylinder and carbon source. System does not have its own vacuum source, must be used on a Desk type sputter coater. This chamber would be placed on top of the baseplate of the desk unit to untilize the vacuum source. 115V, 50/60Hz
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Inventory Number: 64755
Retail (USD):
$1,600.00
Now (USD):
$1,600.00
MRC Sputtering System CPU Boards. 882-52-000 Intel CPU Boards for 603 903 or 943 model II or III systems. 5 CPU Boards available as well as many other boards for these systems.
Product Details
Inventory Number: 64756
Retail (USD):
$115,000.00
Now (USD):
$115,000.00
Dynavac 4 Target DC Sputtering System with Load/lock and RF Etch.
Capable of sequential and simultaneous deposition of up to two targets at once. Configured in a sputter down mode to deposit metals onto a single rotating substrate fixture capable of holding a 150mm substrate. Four Angstrom Sciences 102mm diameter magnetron cathodes with angular adjustment of up to 30° and an adjustable source to substrate distance from 3" to 8". Cathodes powered by an Advanced Energy 3KW dual output power supply. Substrates are loaded automatically by the load lock robot. Manual operation also available. RF Plasma Cleaning for conditioning substrates prior to deposition. Vacuum chamber is 600mm x 600mm x 600mm 304 stainless steel construction. Chamber high vacuum via CTI 10" cryo pump and the load lock is pumped by a turbo pump. The operator interface consists of a computer running Microsoft Windows 7 and Rockwell software RSview HMI software package. Provides the operator with graphical interface and control functions required for operation. Organized into a series of menu-driven screens that provide clear access to various levels of system control. System can be run fully automated via a process recipe or in manual modes. 208V, 3Ph, 60Hz, 150A. System year of manufacture 2016. Very Nice Condition.
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