Sputtering Systems

Gencoa Planar Magnetron Cathode. Target Area: 29-1/2 in. x 4-7/8 in. Gas input. With cart for maintenance of cathode.

Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

Denton Vacuum Explorer 14 DC Sputtering System. Chamber: 12 in. dia. x 18 in. H glass Pyrex bell jar with guard. 15-inch dia. baseplate/pumping plenum assembly supported by system cabinet. System mounted on casters. Pumping System: Turbomolecular pump, LN2 trap located beneath high vacuum poppet valve and manual fill via external funnel. Alcatel 2010 two stage, rotary vane pump. Sputter Source: (1) DSM-300A cold sputter module. 300W DC power supply, 4-inch dia. magnetron sputter source with Denton Vacuum patented ANODE GRID® for maximum electron capture and minimal specimen heating. Variable source to substrate distance. Substrate Fixturing: 8.0 in. Omni rotating fixture plate, speed adjusts via input to system touch screen. Air operated shutter. Control System: The Explorer 14 system is semiautomatic and is controlled by a DL205 CPU from Automationdirect. The operator interface is a touch panel with graphical interface to the PLC. Graphical interface is supported with Automationdirect software. Manual operation of valves, pumps, low voltage sources and fixture rotation subsystems is through this graphical interface. Semiautomatic processes are also operated through this interface.

Edwards S150B Cool Sputter Coater for SEM Samples. Easy to use full instrumentation. Adjustable target to work table distance. No gold target with system. Built in vacuum pump. 110V, 60 Hz, 8A.

Kurt J. Lesker CMS-18 Six Target Load Locked RF DC Sputtering System. Dual chamber with load lock. Three cathodes in each chamber for total of six cathodes. PLC Process control (programmable depositions). Substrates up to 8 in. dia. Substrate rotation. Substrate bias, RF and DC. Substrate heater up to 500 deg C. 3-inch Magnetron sputter cathodes. Process Gases: Ar, O2, N2. RF and DC power supplies. CALL FOR PRICE.

NOT RECENT PHOTO MISSING RFX-600, ATX-600 AND TWO TURBO CONTROLLERS

Emitech K575 Turbo Sputter Coater. Turbo pumped table top SEM sample sputtering system capable of sputter precious metals, chromium or other metals. Full automatic control. Ultra high resolution, less than 0.5 nm chromium grain size. Magnetron cathode. 6-inch dia. chamber. Target size 54mm x 0.2 nm thick. 220V, 50/60 Hz, 10A.

Ted Pella 6000 Sputter Coater for SEM Samples. Gold sputtering system for small samples, no gold target with system. Variable height sample holder. Requires external vacuum pump, not included. 115V, 60 Hz.

Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.