Sputtering Systems

SEM Sample Sputter Coater. Magnetically enhanced sputter head minimizes sample heating. Automatic slow venting at power down. Sample stage accommodates up to a 3 in. dia. substrate or SEM stubs. Self-contained two stage vacuum pump. Does not come with gold target. 120V, 60 Hz.

Benchtop Vacuum Coater for TEM/SEM Sputter Coater and Carbon Coater. Currently configured sputtering source (ring type) and carbon coating source. E5350 power supply. 12 in. x 12in. bell jar with implosion guard. 110V, 60 Hz.

Five Target RF and DC Magnetron In Line Sputtering System. Currently configured for single sided sputtering but cathodes can be moved manually if double sided sputtering is desired. Target Size: 3-1/2 in. x 18 in. Easy access to cathodes via hinged doors. Currently configured with 4 DC and 1 RF cathodes. Multiple CTI cryopumps for high vacuum. Load lock chambers on both ends. Loader handles up to 28 20 in. H panels or pallets. Variable speed pallet transport system. Tested: $119,000. As Is Untested: $69,000.

DC Sputtering System. Chamber: 12 in. dia. x 18 in. H glass Pyrex bell jar with guard. 15-inch dia. baseplate/pumping plenum assembly supported by system cabinet. System mounted on casters. Pumping System: Turbomolecular pump, LN2 trap located beneath high vacuum poppet valve and manual fill via external funnel. Alcatel 2010 two stage, rotary vane pump. Sputter Source: (1) DSM-300A cold sputter module. 300W DC power supply, 4-inch dia. magnetron sputter source with Denton Vacuum patented ANODE GRID® for maximum electron capture and minimal specimen heating. Variable source to substrate distance. Substrate Fixturing: 8.0 in. Omni rotating fixture plate, speed adjusts via input to system touch screen. Air operated shutter. Control System: The Explorer 14 system is semiautomatic and is controlled by a DL205 CPU from Automationdirect. The operator interface is a touch panel with graphical interface to the PLC. Graphical interface is supported with Automationdirect software. Manual operation of valves, pumps, low voltage sources and fixture rotation subsystems is through this graphical interface. Semiautomatic processes are also operated through this interface.

Sputter Coater for SEM Samples. Provides a uniform, conductive, fine grained coating. Self-contained unit with built-in pump. Advanced design magnetron sputterhead for truly cold sputtering. Etch mode for sample cleaning. 6 in. OD pyrex chamber. Sputters precious metals, no target included. Does not require gas. 120V, 50/60 Hz, 10A.

Sputtering System. The Auto 500 box chamber system is a versatile front loading thin film system for Research & Development or preproduction.  The chamber is mounted on a pedestal, housing the pumping stack. A rack panel next to the vacuum pedestal houses controls for vacuum and all thin film processes accessories. Three RF magnetron cathodes, two are 4 in. dia. and one is 3 in. dia.  Rotating Substrate Carrier: 11 in. dia.  Includes RF etch.  Crystal film thickness monitor.  Turbo pump with controller and roughing pump.

Cool Sputter Coater for SEM Samples. Easy to use full instrumentation. Adjustable target to work table distance. No gold target with system. Built in vacuum pump. 110V, 60 Hz, 8A.

Cold Deposition/Etch Sputter Coater. Simple automatic operation. Extra large chamber: 8 in. dia. x 8 in. H. Ring type cathode 4 in. dia. (gold not included). 6 in. dia. specimen stage for multiple specimens. Self contained vacuum system.

Turbo Sputter Coater. Turbo pumped table top SEM sample sputtering system capable of sputter precious metals, chromium or other metals. Full automatic control. Ultra high resolution, less than 0.5 nm chromium grain size. Magnetron cathode. 6-inch dia. chamber. Target size 54mm x 0.2 nm thick. 220V, 50/60 Hz, 10A.

Target Area: 29-1/2 in. x 4-7/8 in. Gas input. With cart for maintenance of cathode.