Equipment Photos

Equipment Details

Inventory Number: 64756
Category: Sputtering Systems
Manufacturer: Dynavac
Dynavac 4 Target DC Sputtering System with Load/lock and RF Etch.
Capable of sequential and simultaneous deposition of up to two targets at once. Configured in a sputter down mode to deposit metals onto a single rotating substrate fixture capable of holding a 150mm substrate. Four Angstrom Sciences 102mm diameter magnetron cathodes with angular adjustment of up to 30° and an adjustable source to substrate distance from 3" to 8". Cathodes powered by an Advanced Energy 3KW dual output power supply. Substrates are loaded automatically by the load lock robot. Manual operation also available. RF Plasma Cleaning for conditioning substrates prior to deposition. Vacuum chamber is 600mm x 600mm x 600mm 304 stainless steel construction. Chamber high vacuum via CTI 10" cryo pump and the load lock is pumped by a turbo pump. The operator interface consists of a computer running Microsoft Windows 7 and Rockwell software RSview HMI software package. Provides the operator with graphical interface and control functions required for operation. Organized into a series of menu-driven screens that provide clear access to various levels of system control. System can be run fully automated via a process recipe or in manual modes. 208V, 3Ph, 60Hz, 150A. System year of manufacture 2016. Very Nice Condition.
Now (USD): $115,000.00

Products Similar to: Dynavac Multi-Layer DC Sputtering System

Used Gencoa Planar Magnetron Cathode

Inventory Number: 56694
Now (USD): $2,500.00

Gencoa Planar Magnetron Cathode. Target Area: 29-1/2 in. x 4-7/8 in. Gas input. With cart for maintenance of cathode.

Product Details

Used Gencoa Planar Magnetron Cathode

Inventory Number: 56692
Now (USD): $2,500.00

Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

Product Details

Used Gencoa Planar Magnetron Cathode

Inventory Number: 56693
Now (USD): $2,500.00

Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

Product Details

Used MRC 603/903/943 Sputtering System CPU Boards

Inventory Number: 64755
Now (USD): $1,600.00

MRC Sputtering System CPU Boards. 882-52-000 Intel CPU Boards for 603 903 or 943 model II or III systems. 5 CPU Boards available as well as many other boards for these systems.

Product Details

Used Emitech K550X

Inventory Number: 64836
Now (USD): $5,250.00

Emitech K550X Sputter Coater SEM Sample Sputtering System. The Emitech K550X Sputter Coater system employs a magnetron target assembly to enhance the efficiency of processes using low voltages and producing a fine grain cool sputtering without the need to cool the target specimen stage. The specimen stage is suitable for a range of specimens and stubs, with pre-selectable parameters and automatic control for repeatable film thickness depositions.

Features of the Emitech K550X Sputter Coater:

  • Deposition Range: 0-50mA
  • Deposition Rate: 0-25nm/min
  • Fully automatic control
  • Low voltage sputtering
  • High resolution fine coating
  • Pre-selectable parameters and automatic control
  • Special rotating stage with full tilt facility
  • Even and repeatable thickness deposition
  • Easy loading and unloading of specimens
  • User-friendly control panel
  • 165mm Diameter chamber
  • Specimen stage – suitable for a range of specimens and stubs

 DOES NOT INCLUDE GOLD TARGET MATERIAL.

Product Details