Equipment Photos

Equipment Details

Inventory Number: 64913
Category: Sputtering Systems
Manufacturer: Ted Pella

Ted Pella Cressington 108 Auto Sputter Coater for SEM Samples. The Cressington 108auto sputter coater offers the choice of manual or automatic operation. The specification also includes a vent gas inlet and argon purge control. In automatic mode the  digital timer can be used to give repeatable coatings. The sputter current and argon gas pressure are set independently for the desired coating conditions. There is not a gold target with the tool. This must be purchased separately. 115V, 60Hz, .4A

Now (USD): $4,950.00

Products Similar to: Ted Pella Cressington 108 Auto

Used Gencoa Planar Magnetron Cathode

Inventory Number: 56694
Now (USD): $2,500.00

Gencoa Planar Magnetron Cathode. Target Area: 29-1/2 in. x 4-7/8 in. Gas input. WE NO LONGER HAVE THE CART, ONLY THE CATHODE!

Product Details

Used Gencoa Planar Magnetron Cathode

Inventory Number: 56692
Now (USD): $2,500.00

Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

Product Details

Used Gencoa Planar Magnetron Cathode

Inventory Number: 56693
Now (USD): $2,500.00

Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

Product Details

Used MRC 603/903/943 Sputtering System CPU Boards

Inventory Number: 64755
Now (USD): $1,600.00

MRC Sputtering System CPU Boards. 882-52-000 Intel CPU Boards for 603 903 or 943 model II or III systems. 5 CPU Boards available as well as many other boards for these systems.

Product Details

Used Dynavac Multi-Layer DC Sputtering System

Inventory Number: 64756
Now (USD): $115,000.00

Dynavac 4 Target DC Sputtering System with Load/lock and RF Etch.
Capable of sequential and simultaneous deposition of up to two targets at once. Configured in a sputter down mode to deposit metals onto a single rotating substrate fixture capable of holding a 150mm substrate. Four Angstrom Sciences 102mm diameter magnetron cathodes with angular adjustment of up to 30° and an adjustable source to substrate distance from 3" to 8". Cathodes powered by an Advanced Energy 3KW dual output power supply. Substrates are loaded automatically by the load lock robot. Manual operation also available. RF Plasma Cleaning for conditioning substrates prior to deposition. Vacuum chamber is 600mm x 600mm x 600mm 304 stainless steel construction. Chamber high vacuum via CTI 10" cryo pump and the load lock is pumped by a turbo pump. The operator interface consists of a computer running Microsoft Windows 7 and Rockwell software RSview HMI software package. Provides the operator with graphical interface and control functions required for operation. Organized into a series of menu-driven screens that provide clear access to various levels of system control. System can be run fully automated via a process recipe or in manual modes. 208V, 3Ph, 60Hz, 150A. System year of manufacture 2016. Very Nice Condition.

Product Details