Used Karl Suss MJB3

Karl Suss MJB3 Standard Mask Aligner. System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. Ask salesperson about available chucks and sizes. Hard or soft contact modes. 365nm to 400nm spectrum of a 200W high pressure arc lamp. Alignment optics consist of normal field microscope with objective turret for different magnifications. 110V, 60 Hz.

Thermo Oriel Accudose 9000 Photospeed Tool. Measures batch to batch photospeed variations. Photoresist testing system. Oriel part 83995 near UV system with fast shutter. Assures that exposure dosage is in-line with your process window requirements. No need to sideline your expensive stepper for photoresist testing. Provides accurate, incremented bulk area exposures across a wafer. Use it to quantify threshold exposure, spectra variations, find potential resist problems and verify lot to lot consistency.

Karl Suss MJB3 Standard Mask Aligner. System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. Ask salesperson about available chucks and sizes. Hard or soft contact modes. 365nm to 400nm spectrum of a 200W high pressure arc lamp. Alignment optics consist of normal field microscope with objective turret for different magnifications. 110V, 60 Hz.

Honle UVASPOT 400T High Powered Ultra-Violet UV Curing System. The UVASPOT 400T is used in laboratories and in production processes in widely varying sectors of industry for: Hardening UV reactive polyester resins and casting masses (e.g. tanks, containers, pipes and plastic parts). Testing UV resistance of paints, varnishes, textiles and coatings. Fluorescence testing. Hardening UV reactive adhesives (bonding glass, plastic, metal as well as electronic, precision mechanical and optical components). UV radiation in chemical, biological and pharmaceutical research and production. Coating PC boards. Custom cabinet with pull-out tray: 21 in. x 23 in. 230V, 50 Hz, CE.

Oriel 87437-1000 UV Flood Exposure System. 500W UV lamp housing operating in the 350 to 450nm spectral region. Beam Size: 8” x 8”. 200-500W Hg arc lamp power supply. System needs new power supply and electronics inside tower. Needs controller upgrade.

AB-M Mask Aligner and UV Exposure System. 350W lamp housing with power supply, currently configure with 200W bulb. Precision alignment stage.
Mask Holder: 4” x 4” with 3” diameter substrate holder. Chuck and mask holder available for 2" substrates also. System will not do larger substrates.
Exposure timer. Splitfield Zeiss microscope for easier alignment. 120V, 50/60 Hz.

UVOCS T10X10 UV Ozone Cleaner. Organic contamination removal accomplished by the combination of ultaviolet light and ozone. Source Size: 10” x 10”. Active Area: 100 square inches. 110V, 60 Hz, 2.5A

ABM High Performance Tabletop Deep UV Mask Alignment and DUV Exposure System. Table top mask aligner. Adjustable vacuum contact or proximity printing. Precision alignment module for piece parts up to 4” maximum, currently configured with a 100mm diameter chuck. Different sizes available at additional price. Uniform collimated exposure beam, final lens diameter is 6.5”. Wavelength: 220nm. 500W power supply. Dual cameras for alignment. 120V, 50/60 Hz.

Karl Suss MJB3 Standard Mask Aligner. System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. Ask salesperson about available chucks and sizes. Hard or soft contact modes. 365nm to 400nm spectrum of a 200W high pressure arc lamp. Alignment optics consist of normal field microscope with objective turret for different magnifications. 110V, 60 Hz.

Karl Suss Precision High Resolution Vacuum Base Probe Manipulator. High resolution micropositioner provides ultra precise control needed for submicron wafer probing. Does not have tip holder, only what is in the photo.