STI

Semitool STI 870 Spin Rinser Dryer Double Stack. 6” Wafer Rotor in the top spinner and a 4" Rotor in the bottom spinner. High performance cleaning, rinsing and drying system for 25 wafer batch cassette. This system is capable of cleaning substrates from 2” to 6” round if the correct Rotor is installed for that wafer size. On axis orientation keeps wafers parallel allowing DI water manifolds to spray both sides of product continuously and simultaneously. Built in resistivity monitor. 120V, 50/60 Hz,

Semitool STI ST 260 Spin Rinser Dryer. High performance cleaning, rinsing and drying system for 25 wafer batch cassette. Currently configured with Rotor for 2” wafers. This system is capable of cleaning substrates from 2” to 5” round if the correct Rotor is installed for that wafer size. On axis orientation keeps wafers parallel allowing DI water manifolds to spray both sides of product continuously and simultaneously. Built in resistivity monitor. 120V, 50/60 Hz,