Plasmatherm

Plasmatherm SLR-720/720 Dual Chamber RIE Reactive Ion Etch System. PC controller with graphical user interface. Dual chamber unit with robot loader. Was lasted used to process 4" wafers. RF5S 500W, 13.56 MHz RF Generator. Comes with a Turbo pump but does not come with roughing pump. Currently confi gured with nine MFC. 208V, 3 Ph, 60 Hz. Sold as is where is untested at this price.

Plasmatherm SLR ICP Shuttle Lock ICP Inductively Coupled Plasma Etch System. PC controller. Vacuum load lock with wafer transfer robot. Can process wafers from 2” to 8” depending on which process kit is installed. Currently configured with 4” kit.  High frequency RF-based inductively coupled plasma source capable of high density plasma generation. Closed loop pressure control. Turbo pump with roughing pump. Total of eight MFC gas controllers. Includes water chiller and roughing pump. 208V, 3Ph, 60Hz