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Oxford Instruments

Used Oxford Instruments 90 Plus RIE

Inventory Number: 62737
Now (USD): $19,500.00

Oxford Instruments 90 Plus RIE Reactive Etcher with Loadlock. Small batch load-locked RIE with 275 mm electrode. Easy to use computer interface controls all system functions. 13.56 MHz RF generator, 600W. Gas box with four MFC. Previous gases used: Oxygen, Boron Trichloride, Chlorine and Nitrogen. SYSTEM SOLD AS IS WHERE IS, ONLY WHAT IS IN THE PHOTOS.

Product Details

Used Oxford Instruments Plasmalab 800 Plus PECVD

Inventory Number: 63975
Now (USD): $75,000.00

Oxford Plasmalab 800 Plus PECVD Plasma Deposition System

  • Plasma Enhanced Chemical Vapor Deposition 
  • Automatic pressure control
  • Substrate electrode: 460mm with PID control
  • Can process wafer pieces
  • Shower head gas inlet optimized for PECVD
  • 400° C substrate table
  • System Computer
  • PC control with OPT software under Windows
  • System software controls all aspects of machine functionality and control of the process operation
  • Production mode: system will perform the following sequence without any operator intervention: chamber pumping, recipe running, chamber venting
  • Process chamber includes a window panel giving a view on the process table
  • System Chiller
  • Edwards IHX 610 Vacuum Pump
  • Advanced Energy LF-5 RF Generator
  • Power: 208VAC, 3PH, 50/60 HZ
  • Gas Box with MKS MFCs consisting of:
  • 1)  Gas: CF4
  • 2)  Gas: N2
  • 3)  Gas: N2O
  • 4)  Gas: SiH4
  • 5)  Gas: N2
  • 6)  Gas: O2 

Product Details