ABM

AB-M Mask Aligner and UV Exposure System. 350W lamp housing with power supply, currently configure with 200W bulb. Precision alignment stage.
Mask Holder: 4” x 4” with 3” diameter substrate holder. Chuck and mask holder available for 2" substrates also. System will not do larger substrates.
Exposure timer. Splitfield Zeiss microscope for easier alignment. 120V, 50/60 Hz.

ABM High Performance Tabletop Deep UV Mask Alignment and DUV Exposure System. Table top mask aligner. Adjustable vacuum contact or proximity printing. Precision alignment module for piece parts up to 4” maximum, currently configured with a 100mm diameter chuck. Different sizes available at additional price. Uniform collimated exposure beam, final lens diameter is 6.5”. Wavelength: 220nm. 500W power supply. Dual cameras for alignment. 120V, 50/60 Hz.