Wafer Analysis

Automated Defect Inspection System. Inspection of whole wafers, sawn wafers, JEDEC trays, Auer boats, die in gel/waffle paks, MCM’s. Detects defects down to 0.5 micron. Automated wafer mapping and identification. Automated data collection and reporting. Menu-based, easy to use Windows environment. 200-240V, 1 Ph, 50/60 Hz, 5A, CE.

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR CDE SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Four Point Probe Resistivity Measurement System. Four point probe system for mapping resistivity on substrates from 2 in. to 8 in. dia. Manual loading of subtrates. Measurement Range: 2 milliohms/sq. to 5 megaohms/sq. Polar maps, rectangular maps, line scan or user defined patterns. 115/230V, 60 Hz.

FULLY TESTED AND READY TO SHIP!

Four Point Probe Resistivity Mapping System. Designed to meet the needs of process development and tool characterization engineers, this four point probe has the accuracy, repeatability and reliability required. Wafer Size: 2 to 8 in. manual load. Typical Measurement Time: 1 sec. per site. Mapping Patterns: Polar map (align with notch/flat; rectangular map (choose inside edge exclusion); line scan (diameter, radius or any point to point diameter, minimum step 0.1mm); user defined (template). Measurement Range: 2 milliohms per sq. to 5 megaohms per sq. (can be optimized to 1 milliohm per sq.).

Large Substrate Resistivity Mapping System. Designed to meet the needs of 300 mm process development and large substrate film characterization. Can handle wafers from 2 in. to 12 in. dia. and square substrates up to 8.6 in. x 8.6 in. Polar maps, rectangular maps, line scan or user defined scans. 120V, 60 Hz, CE.

Auto Cassette Load 4 Point Probe Resistivity Mapping System. Designed to meet the needs of process development and tool characterization engineers, this four point probe has the accuracy, repeatability and reliability required. Types of data available are contour maps, 3D, line, data maps, histogram, diameter or radius scans, user defined and polar map. Auto cassette loading of wafers from 6 in. to 12 in. dia. Manual loading required for 2 in. and 3 in. wafers. Measurement Range: 2m ohm/sq to 5M ohm/sq. 115/230V, CE. Uses a four point probe to take measurements.

Non-Contact Profile Measurement System. Uses laser triangulation to analyze two dimensional data. Non-contact measurement allows you to work with wet and fragile samples. PC controller analyzes data. Motorized stage. 120V, 60 Hz.

Fluorescent X-Ray Measurement System. X-Y Stage: 3 in. x 3 in. Travel Z. Adjustment: 1.3 in. Min. Measurement area: .005 in. Sold AS IS.

Critical Point Dryer. The EMS 850 Critical Point Dryer is designed for use with CO2, having first replaced any water in the specimen by a series of dehydration, often in the same fluid such as Acetone, which will also be the intermediate fluid. The EMS 850 is fitted with thermoelectronic heating and cooling and temperature control of +5 deg C on cooling and +35 deg C on heating. This ensures the critical point is accurately obtained avoiding excess pressures or temperatures, or the need to rely on pressure relief valves to control pressure during the heating cycle. Specimen Chamber: 30mm dia. x 40mm H.

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR FLEXUS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Dual Wavelength 500 deg C Scanning Thin Film Stress Measurement System. Detects conditions that lead to reliability problems such as cracking,voiding, lifting and hillock formation. Wafer topography can be displayed in both 2-D and 3-D views. User programmable scan range up to 150 mm. Measurement Range: 2 x 10^2 to 4 x 10^10 dyne/cm^2. 115V, 50/60 Hz, 10A.

Multiwavelength 200mm Ellipsometer. Has a software disk but no cables or controls. Missing computer and stage driver. Two wavelength ellipsometers use additional laser sources to analyze difficult films. 8 in. dia. stage with motorized stage, no controller. Sold As Is with 30 day ROR.