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Plasma Etchers - Ashers - Ion Mills

Used Axcelis Gemini

Inventory Number: 58883
Now (USD): $135,000.00

Dual Chamber Microwave Downstream Plasma Asher. Stand-alone system for the dry removal of photoresist compounds from silicon wafers. Process is accomplished by oxidizing the resist using high temperatures and process gases in the form of a plasma generated by microwave energy. Two process chambers significantly increase system throughput. Touchscreen user interface. Was used as downstream asher for photoresist stripping. Currently configured for 150mm wafers. Gas box with six MFC for each chamber, N2, O2, N2, H1, NH3 and Forming. System was able to select any or all of the connected gases and control the mix and flow of them into each of the process chambers. Was fully functional prior to removal from cleanroom. Refurbished Price: $135,000. As Is Price: $99,000.

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Used Ccr Technology COPRA DN 160

Inventory Number: 57328
Now (USD): $9,500.00

Inductively Coupled Plasma Source for PECVD, Surface Cleaning, Oxidation, Nitridation and Activation Processes. 8 in. CF single turn ICP RF plasma source head with integral RF Matchbox and Advanced Energy RFX-600 RF generator with Delta Elektronica ES 150W DC power supply 0-15V, 0-10A output. CCU transverse magnetic field control unit to maintain resonance conditions. Capable of forming a quasi-neutral beam with well defined and controlled parameters. Useful for many applications including cleaning, milling, ion assisted deposition, oxygenation, PECVD, surface modifications of plastics, RIE and plasma etch. Delivers very high currents even at very low energies. 120V, 50/60 Hz.

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Used Gatan 600 CTMP

Inventory Number: 53783
Now (USD): $10,950.00

Turbo Pumped Argon/Reactive Plasma DuoMill Dual Station Ion Milling System. Ion milling system for the preparation of high quality TEM specimens. Two independent milling stations mounted on a single high speed vacuum system. Each milling station has a Whisperlok specimen exchange system which functions without disturbing the vacuum or milling conditions of the other station and two Octogun ion guns.

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Used Hypervision CHIP UNZIP

Inventory Number: 48882
Now (USD): $6,500.00

Backside Preparation System. Low stress backside preparation system is useful for the development and analysis of flip-chips, lead-on-chips packaging and advanced chip design with more than 3 metallization layers. Software controlled milling to remove semiconductor packaging materials: epoxy molding compound, ceramic, metal and perform backside thinning on silicon die.

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Used March Instruments PX 500

Inventory Number: 57071
Now (USD): $29,500.00

Batch Plasma Treatment System. Gas plasma treatment provides a fast efficient method for surface treatment and cleaning. Automatic process control of vacuum and gas flow, chamber pressure, power level and endpoint. Configured for 2 process gas and N2. 13.56 MHz RF generator. Two electrodes 8 in. x 13 in. Includes vacuum pump.

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Used March Instruments CS 1701

Inventory Number: 55116
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR MARCH INSTRUMENTS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Benchtop Reactive Ion Etching System (RIE). Tabletop plasma RIE system. Microprocessor control system provides user with flexibility and ease of use. Four MFC gas inputs. Capable of processing substrates up to 6 in. dia. RF generator 600W, 13.56 MHz. Includes vacuum pump.

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Used March Instruments JUPITER II

Inventory Number: 38966
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR MARCH INSTRUMENTS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Tabletop Reactive Ion Etcher. Parallel plate reactive ion etcher capable of handling up to a 6 in. wafer. 300 Watt 13.56 MHz RF Generator. Currently configured for one process gas and an N2 purge gas. Can be upgraded to handle 4 process gas inputs. With pump.

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Used March Instruments PX 1000

Inventory Number: 58161
Now (USD): $32,000.00

Plasma Etcher/Cleaner. Batch systems for plasma cleaning or etching. Currently configured with only one 17 in. x 14 in. shelf set. Can accommodate multiple shelves. RFX 600 13.56 MHz, 600W RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.

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Used March Instruments PX 500

Inventory Number: 58174
Now (USD): $29,500.00

Batch Plasma Treatment System. Provides a fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. Automatic process control of vacuum and gas flow, chamber pressure, power level and endpoint. Configured for two process gases and nitrogen. Advanced Energy RFX 600 13.56 MHz, 600W RF generator. Single 8 in. x 13 in. electrode shelf set. Includes vacuum pump.

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Used March Instruments PX 250

Inventory Number: 58551
Now (USD): $21,500.00

Plasma Cleaning System. Multiple removable shelves can easily be configured to provide downstream or direct plasma. Shelves: 6 in. x 6 in. 300W, 13.56 MHz RF Generator. Includes vacuum pump. Two MFC gas inputs. Fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. 208/230V, 1 Ph, 50/60 Hz, CE.

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