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Plasma Etchers - Ashers - Ion Mills

Used Axcelis Gemini Plasma Asher

Inventory Number: 58883
Now (USD): $99,000.00

Dual Chamber Microwave Downstream Plasma Asher. Stand-alone system for the dry removal of photoresist compounds from silicon wafers. Process is accomplished by oxidizing the resist using high temperatures and process gases in the form of a plasma generated by microwave energy. Two process chambers significantly increase system throughput. Touchscreen user interface. Was used as downstream asher for photoresist stripping. Currently configured for 150mm wafers. Gas box with six MFC for each chamber, N2, O2, N2, H1, NH3 and Forming. System was able to select any or all of the connected gases and control the mix and flow of them into each of the process chambers. Was fully functional prior to removal from cleanroom. Refurbished Price: $99,000. As Is Price: $79,000.

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Used Gatan 600 CTMP

Inventory Number: 53783
Now (USD): $10,950.00

Turbo Pumped Argon/Reactive Plasma DuoMill Dual Station Ion Milling System. Ion milling system for the preparation of high quality TEM specimens. Two independent milling stations mounted on a single high speed vacuum system. Each milling station has a Whisperlok specimen exchange system which functions without disturbing the vacuum or milling conditions of the other station and two Octogun ion guns.

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Used March Instruments CS 1701

Inventory Number: 55116
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR MARCH INSTRUMENTS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Benchtop Reactive Ion Etching System (RIE). Tabletop plasma RIE system. Microprocessor control system provides user with flexibility and ease of use. Four MFC gas inputs. Capable of processing substrates up to 6 in. dia. RF generator 600W, 13.56 MHz. Includes vacuum pump.

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Used March Instruments JUPITER II

Inventory Number: 38966
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR MARCH INSTRUMENTS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Tabletop Reactive Ion Etcher. Parallel plate reactive ion etcher capable of handling up to a 6 in. wafer. 300 Watt 13.56 MHz RF Generator. Currently configured for one process gas and an N2 purge gas. Can be upgraded to handle 4 process gas inputs. With pump.

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Used March Instruments PX 1000E8

Inventory Number: 58786
Now (USD): $27,500.00

Plasma Asher/Etcher with Pneumatic Vertical Door. Batch system for plasma cleaning or etching. Currently configured with one shelf set: 17 in. x 14 in. Can accommodate multiple shelves. RFX 600 13.56 MHz RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.

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Used March Instruments PX 1000

Inventory Number: 58161
Now (USD): $27,500.00

Plasma Etcher/Cleaner. Batch systems for plasma cleaning or etching. Currently configured with only one 17 in. x 14 in. shelf set. Can accommodate multiple shelves. RFX-600 13.56 MHz, 600W RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.

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Used Metroline/IPC 7102

Inventory Number: 56528
Now (USD): $15,000.00

Automatic Plasma Treatment and Cleaning System. Menu driven programming with multi-step features. Parallel plates electrodes mounted vertically. Total of four sets with a surface area of 13 in. H x 28 in. D and a spacing of 1 in. between plates. Two gas inputs controlled via MFC. PE-2500 RF generator. Includes vacuum pump.

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Used Metroline/IPC M4L

Inventory Number: 60416
Now (USD): $25,000.00

PVA Tepla RF Plasma Surface Modification System. Three gas five shelves. Shelf Size: 11.25 in. L x 13 in. W. The M4L is ideal for:  Plasma surface modification, Plasma cleaning of organic surfaces, Bond strength enhancement, Plasma etch applications. Plasma asher applications. The entire bench top system fits in one cabinet, except for the vacuum pump. Controller: Windows® O/S based touch screen interface offering fully automatic control. Multi-step recipes, real time graphic display, multi-level password access, data logging, and real time SPC monitoring of all plasma parameters is provided.

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Used Novellus Gasonics PEP 3010A

Inventory Number: 60585
Now (USD): $85,000.00

High Throughput Plasma Asher. Key features of the 3010A include lamp-based chamber heating, which enables rapid changes in chamber temperature, and closed-loop temperature control for precise monitoring of wafer temperature during processing. User friendly graphical user interface, which facilitates the tracking of wafer statistics. • Through-the-Wall Installation. • Wafer Handler: PEP 3010A/A(H). • Build Configuration: 97-3250. • Dual Cooling Stations. • Yaskawa Robot. • XU-CM4730 (2/2004), s/nS3K594-2-02. • Controller: IBM 7587 w/CD-ROM. • 208VAC, 60Hz, 3Phase WYE, 20A. • Left Module: PEP3010A/A (L). • Build Configuration: 95-2712. • AGL Microwave Generator. • Process Controller: IBM 7587. • Gas Configuration: O2, N2, Forming, N2, CDA. • Right Module: PEP3010A/A (R). • Build Configuration: 95-2715. • AGL Microwave Generator. • Process Controller: IBM 7587. • Gas Configuration: O2, N2, Forming, N2, CDA. • Qty 2 - Edwards QDP 80 Dry Pumps.

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Used Novellus Gasonics PEP Iridia DL

Inventory Number: 60586
Now (USD): $110,000.00

Plasma Asher. The Novellus PEP Iridia integrates production proven technologies to offer high-throughput implant strip and post-etch clean process solutions. Iridia’s Directional Downstream Plasma source is comprised of a directional RF source paired with a versatile, downstream microwave source. The integrated lamp module with state-of-the-art, closed-loop wafer temperature control enables multi-temperature processing in a single chamber. Designed for aggressive fluorine and reducing chemistries, the Iridia offers unsurpassed flexibility in handling your production needs, including high dose implant strip (HDIS), Front End of Line (FEOL) cleans, and post-etch cleans for aluminum and copper interconnects.  Was fully functional when deinstalled.  Will be fully tested at time of sale.  • Through-the-Wall Installation. • Wafer Handler: PEP 4800DL(H). • Build Configuration: 95-0526. • Dual Cooling Stations. • Kensington DUAL MULTI-LINK Robot. • Controller Model 4000C, s/n 97-396-96. • Controller: IBM 7587 w/CD-ROM. • 208VAC, 60Hz, 3Phase WYE, 30A. • Left Module: PEP4800DL (L). • Build Configuration: 51-2035. • Astex Microwave Generator. • ENI ACG-5XL RF Generator. • Process Controller: IBM 7587. • Gas Configuration: CF4, N2, 4 percent H2/N2, O2, CF4, N2. • Right Module: PEP-4800DL (R). • Build Configuration: 51-2036. • Astex Microwave Generator. • ENI ACG-5XL RF Generator. • Process Controller: IBM 7587. • Gas Configuration: CF4, CF4, N2, CDA, N2, O2, 4 percent H2/N2.

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