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Plasma Etchers - Ashers - Ion Mills

Axcelis Gemini

Inventory Number: 58883
Now (USD): $135,000.00

Dual Chamber Microwave Downstream Plasma Asher. Stand-alone system for the dry removal of photoresist compounds from silicon wafers. Process is accomplished by oxidizing the resist using high temperatures and process gases in the form of a plasma generated by microwave energy. Two process chambers significantly increase system throughput. Touchscreen user interface. Was used as downstream asher for photoresist stripping. Currently configured for 150mm wafers. Gas box with six MFC for each chamber, N2, O2, N2, H1, NH3 and Forming. System was able to select any or all of the connected gases and control the mix and flow of them into each of the process chambers. Was fully functional prior to removal from cleanroom. Refurbished Price: $135,000. As Is Price: $99,000.

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Ccr Technology COPRA DN 160

Inventory Number: 57328
Now (USD): $9,500.00

Inductively Coupled Plasma Source for PECVD, Surface Cleaning, Oxidation, Nitridation and Activation Processes. 8 in. CF single turn ICP RF plasma source head with integral RF Matchbox and Advanced Energy RFX-600 RF generator with Delta Elektronica ES 150W DC power supply 0-15V, 0-10A output. CCU transverse magnetic field control unit to maintain resonance conditions. Capable of forming a quasi-neutral beam with well defined and controlled parameters. Useful for many applications including cleaning, milling, ion assisted deposition, oxygenation, PECVD, surface modifications of plastics, RIE and plasma etch. Delivers very high currents even at very low energies. 120V, 50/60 Hz.

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Gatan 600 CTMP

Inventory Number: 53783
Now (USD): $10,950.00

Turbo Pumped Argon/Reactive Plasma DuoMill Dual Station Ion Milling System. Ion milling system for the preparation of high quality TEM specimens. Two independent milling stations mounted on a single high speed vacuum system. Each milling station has a Whisperlok specimen exchange system which functions without disturbing the vacuum or milling conditions of the other station and two Octogun ion guns.

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Hypervision CHIP UNZIP

Inventory Number: 48882
Now (USD): $6,500.00

Backside Preparation System. Low stress backside preparation system is useful for the development and analysis of flip-chips, lead-on-chips packaging and advanced chip design with more than 3 metallization layers. Software controlled milling to remove semiconductor packaging materials: epoxy molding compound, ceramic, metal and perform backside thinning on silicon die.

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March Instruments CS 1701

Inventory Number: 55116
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR MARCH INSTRUMENTS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Benchtop Reactive Ion Etching System (RIE). Tabletop plasma RIE system. Microprocessor control system provides user with flexibility and ease of use. Four MFC gas inputs. Capable of processing substrates up to 6 in. dia. RF generator 600W, 13.56 MHz. Includes vacuum pump.

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March Instruments JUPITER II

Inventory Number: 38966
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR MARCH INSTRUMENTS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Tabletop Reactive Ion Etcher. Parallel plate reactive ion etcher capable of handling up to a 6 in. wafer. 300 Watt 13.56 MHz RF Generator. Currently configured for one process gas and an N2 purge gas. Can be upgraded to handle 4 process gas inputs. With pump.

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March Instruments PX 1000

Inventory Number: 58161
Now (USD): $32,000.00

Plasma Etcher/Cleaner. Batch systems for plasma cleaning or etching. Currently configured with only one 17 in. x 14 in. shelf set. Can accommodate multiple shelves. RFX 600 13.56 MHz, 600W RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.

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March Instruments PX 1000

Inventory Number: 58787
Now (USD): $32,000.00

Plasma Etcher/Cleaner. Batch systems for plasma cleaning or etching. Currently configured with only one 17 in. x 14 in. shelf set. Can accommodate multiple shelves. RFX-600 13.56 MHz, 600W RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.

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March Instruments PX 1000E8

Inventory Number: 58786
Now (USD): $32,500.00

Plasma Asher/Etcher with Pneumatic Vertical Door. Batch system for plasma cleaning or etching. Currently configured with one shelf set: 17 in. x 14 in. Can accommodate multiple shelves. RFX 600 13.56 MHz RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.

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March Instruments PX 250

Inventory Number: 58551
Now (USD): $21,500.00

Plasma Cleaning System. Multiple removable shelves can easily be configured to provide downstream or direct plasma. Shelves: 6 in. x 6 in. 300W, 13.56 MHz RF Generator. Includes vacuum pump. Two MFC gas inputs. Fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. 208/230V, 1 Ph, 50/60 Hz, CE.

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March Instruments PX 250

Inventory Number: 58552
Now (USD): $21,500.00

Plasma Cleaning System. Multiple removable shelves can easily be configured to provide downstream or direct plasma. Shelves: 6 in. x 6 in. 300W, 13.56 MHz RF Generator. Includes vacuum pump. Two MFC gas inputs. Fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. 208/230V, 1 Ph, 50/60 Hz, CE.

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March Instruments PX 250

Inventory Number: 58767
Now (USD): $21,500.00

Plasma Cleaning System. Multiple removable shelves can easily be configured to provide downstream or direct plasma. Shelves: 6 in. x 6 in. 300W, 13.56 MHz RF Generator. Includes vacuum pump. Two MFC gas inputs. Fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. 208/230V, 1 Ph, 50/60 Hz, CE.

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March Instruments PX 500

Inventory Number: 57071
Now (USD): $29,500.00

Batch Plasma Treatment System. Gas plasma treatment provides a fast efficient method for surface treatment and cleaning. Automatic process control of vacuum and gas flow, chamber pressure, power level and endpoint. Configured for 2 process gas and N2. 13.56 MHz RF generator. Two electrodes 8 in. x 13 in. Includes vacuum pump.

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March Instruments PX 500

Inventory Number: 58174
Now (USD): $29,500.00

Batch Plasma Treatment System. Provides a fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. Automatic process control of vacuum and gas flow, chamber pressure, power level and endpoint. Configured for two process gases and nitrogen. Advanced Energy RFX 600 13.56 MHz, 600W RF generator. Single 8 in. x 13 in. electrode shelf set. Includes vacuum pump.

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Metroline/Ipc 7102

Inventory Number: 56528
Now (USD): $15,000.00

Automatic Plasma Treatment and Cleaning System. Menu driven programming with multi-step features. Parallel plates electrodes mounted vertically. Total of four sets with a surface area of 13 in. H x 28 in. D and a spacing of 1 in. between plates. Two gas inputs controlled via MFC. PE-2500 RF generator. Includes vacuum pump.

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Oxford 80 PLUS RIE

Inventory Number: 57562
Now (USD): $59,000.00

Compact Plasma Reactive Ion Etching System RIE. The vacuum chamber is configured for optimal gas conductance at the wafer thus maximizing etch rate and uniformity. All parameters controlled via front panel display. 9 in. dia. platen. Previously used with four MFC and gases used were CF4, O2, CHF3, AR. Does not have turbo pump option installed. Includes vacuum pump. 208V, 3 Ph, 60 Hz.

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Oxford PLASMALAB 80 Plus

Inventory Number: 55693
Now (USD): $75,000.00

Turbopumped Reactive Ion Etch RIE System. PC controller with graphical user interface. Excellent across chamber uniformity. 500W, 13.56 MHz RF generator. Turbopumped chamber, includes roughing pump. Four gas inputs controlled via MFC. Previous gas used SF, O2, CHF3, N2. Shower head gas delivery method.

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Oxford PLASMALAB 80 Plus PLC

Inventory Number: 56371
Now (USD): Contact for Price

Plasma System. More information to come contact us for details.

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Oxford Instruments Plasmalab System 100+ RIE

Inventory Number: 58989
Now (USD): $35,000.00

Load Locked RIE Reactive Ion Etching System. Missing computer and vacuum pumps. Has turbo pump. Call for details. Sold As Is.

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Plasmatherm 790 6 in. RIE

Inventory Number: 55594
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR PLASMA THERM SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Reactive Ion Etcher. Computer controlled plasma processing tool. Substrate electrode 7 in. dia. holds a 6 in. wafer. Shower head gas introduction. 500W, 13.56 MHz RF generator. Turbo pumped vacuum system. Includes roughing pump. 7 gas inputs controlled via MFC. 208V, 3 Ph, 60 Hz.

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Plasmatherm SLR 720 MF

Inventory Number: 58579
Now (USD): $95,000.00

RIE Reactive Ion Etch System. PC controller with graphical user interface. Single chamber unit with load lock. RF5S 500W, 13.56 MHz RF Generator. Turbo pump with roughing pump. Currently configured with four MFC, others may be added at additional price. 208V, 3 Ph, 60 Hz.

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Plasmatherm SLR 770/770MF

Inventory Number: 58792
Now (USD): $90,000.00

Load Locked Dual Chamber Plasma Etching System. One chamber configured for RIE and the other for ECR. PC controller with graphical user interface. System was refurbished in 2012 and installed at customer site. Unit never went into production due to facility closing. Leasing company selling to recoup costs. Missing the Leybold 1000C turbo pump. $90,000 or best offer. Sold Untested As Is.

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Tegal 801

Inventory Number: 36278
Now (USD): $1,950.00

Inline Plasma Etcher. Fully automatic, microprocessor-based, plasma chemistry etcher designed especially for the etching of thin films deposited on semiconductor wafers. All gas flow rates controlled by mass flow controllers. Sold As Is.

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Tegal 803

Inventory Number: 36279
Now (USD): $1,950.00

Inline Automatic Plasma Etcher. The Plasma Inline 803 is a fully automatic, microprocessor-based plasma chemistry etcher designed especially for the etching of silicon dioxide (Si02) thin film deposited on single crystal or polysilicon semiconductor wafers. It provides up to four process gases, two process channels and a clean channel. Sold As Is.

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Tegal 900E

Inventory Number: 33748
Now (USD): $3,950.00

Cassette to Cassette Photoresist Strip/Backside Etching. Spatula wafer transport from cassette to cassette. Users are guided through programming and operation by menu-driven software and soft-keys via a built in display and an external terminal. System is currently configured for 4 in. wafers. Sold As Is.

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Tegal 900E

Inventory Number: 37628
Now (USD): $3,950.00

Cassette to Cassette Single Wafer Photoresist Stripper. Low particulate spatula handling system. System configured for 4 in. wafers. CRT with process graphics. ENI 13.56 MHz RF Generator. Sold As Is.

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Trion MINILOCK

Inventory Number: 56453
Now (USD): $9,500.00

Single Wafer RIE Etcher. LCD display. Load lock with transfer arm. Current substrate carrier for up to 150mm wafers. Five MFC for gas input. Missing RF generator and vacuum pump. Sold As Is.

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Trion Technology PHANTOM II

Inventory Number: 57573
Now (USD): $59,000.00

ICP Inductively Coupled Plasma Etch System. For applications requiring a downstream, high density plasma source. Allows for higher plasma densities at lower pressures. Tight anisotropy in high aspect ratio structures and reduces microloading effect. Four MFC gas inputs mounted in seperate cabinet. System has turbo pump and roughing pump. Two RFX-600 13.56 MHz RF generators. 200mm substrate chuck.

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Unaxis Plasmatherm 7000

Inventory Number: 58939
Now (USD): $149,000.00

Large Batch RIE Plasma Etching System. Graphical user interface. Manual loading of chamber, no load lock. Top of chamber has showerhead gas delivery holes. 22 in. dia. bottom electrode. Neslab water chiller. Turbo pump and dry roughing pump. RF20 2000W 13.56 MHz RF generator with matching network. Previously Used Gases: Argon, Oxygen, Nitrogen, Freon 23. Gas box currently configured with four mass flow controllers. 208V, 3 Ph, 50/60 Hz, CE. Date of Mfg.: Sept. 2004.

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Xactix XETCH

Inventory Number: 58737
Now (USD): $29,500.00

Xenon Difluoride Etching System. Ideal solution for those seeking a cost effective R&D and pilot production xenon difluoride etch system. Built for high etch uniformity, simplicity, low cost of ownership and a small footprint, the Xetch™ is well suited for both industrial users and universities. The Xetch is a versatile, computer controlled system capable of handling dies, pieces of wafers and wafers depending on the system’s configuration. Last used for 4 in. wafers. Xenon difluoride etching shows high selectivity to silicon over many standard semiconductor materials including photoresist, silicon dioxide, silicon nitride and aluminum. Xenon difluoride etching is a clean, dry process that is proven CMOS neutral for many different CMOS processes. Depending on your device and its package design, the Xetch can release critical structures after bonding and packaging. Fast etching with etch rates up to 10 microns per minute, maximizes productivity.

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Yield Engineering YES G500

Inventory Number: 58711
Now (USD): $29,000.00

Plasma Cleaning System. Clean room compatible plasma cleaning system for surface preparation and gentle cleaning applications. Provides five plasma modes to give engineers flexibility over their cleaning processes; electron-free downstream mode, active mode, RIE mode, active ion trap and downstream ion trap. Utilizes a low plasma generator frequency of 40 kHz to reduce chamber and product heating. Plasma is generated between active trays and grounded trays or chamber walls. Tray Size: 16 in. x 16 in. Laminar airflow eliminates dead spots and enhances plasma uniformity. Three gas inputs. Touch screen PLC controller.

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