Plasma Asher. The Novellus PEP Iridia integrates production proven technologies to offer high-throughput implant strip and post-etch clean process solutions. Iridia’s Directional Downstream Plasma source is comprised of a directional RF source paired with a versatile, downstream microwave source. The integrated lamp module with state-of-the-art, closed-loop wafer temperature control enables multi-temperature processing in a single chamber. Designed for aggressive fluorine and reducing chemistries, the Iridia offers unsurpassed flexibility in handling your production needs, including high dose implant strip (HDIS), Front End of Line (FEOL) cleans, and post-etch cleans for aluminum and copper interconnects. Was fully functional when deinstalled. Will be fully tested at time of sale. • Through-the-Wall Installation. • Wafer Handler: PEP 4800DL(H). • Build Configuration: 95-0526. • Dual Cooling Stations. • Kensington DUAL MULTI-LINK Robot. • Controller Model 4000C, s/n 97-396-96. • Controller: IBM 7587 w/CD-ROM. • 208VAC, 60Hz, 3Phase WYE, 30A. • Left Module: PEP4800DL (L). • Build Configuration: 51-2035. • Astex Microwave Generator. • ENI ACG-5XL RF Generator. • Process Controller: IBM 7587. • Gas Configuration: CF4, N2, 4 percent H2/N2, O2, CF4, N2. • Right Module: PEP-4800DL (R). • Build Configuration: 51-2036. • Astex Microwave Generator. • ENI ACG-5XL RF Generator. • Process Controller: IBM 7587. • Gas Configuration: CF4, CF4, N2, CDA, N2, O2, 4 percent H2/N2.