Used Ultron UH104-8

Thermo Oriel Accudose 9000 Photospeed Tool. Measures batch to batch photospeed variations. Photoresist testing system. Oriel part 83995 near UV system with fast shutter. Assures that exposure dosage is in-line with your process window requirements. No need to sideline your expensive stepper for photoresist testing. Provides accurate, incremented bulk area exposures across a wafer. Use it to quantify threshold exposure, spectra variations, find potential resist problems and verify lot to lot consistency.

Karl Suss MJB3 Standard Mask Aligner. System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. Ask salesperson about available chucks and sizes. Hard or soft contact modes. 365nm to 400nm spectrum of a 200W high pressure arc lamp. Alignment optics consist of normal field microscope with objective turret for different magnifications. 110V, 60 Hz.

Honle UVASPOT 400T High Powered Ultra-Violet UV Curing System. The UVASPOT 400T is used in laboratories and in production processes in widely varying sectors of industry for: Hardening UV reactive polyester resins and casting masses (e.g. tanks, containers, pipes and plastic parts). Testing UV resistance of paints, varnishes, textiles and coatings. Fluorescence testing. Hardening UV reactive adhesives (bonding glass, plastic, metal as well as electronic, precision mechanical and optical components). UV radiation in chemical, biological and pharmaceutical research and production. Coating PC boards. Custom cabinet with pull-out tray: 21 in. x 23 in. 230V, 50 Hz, CE.

Honle UVASPOT 400T High Powered Ultra-Violet UV Curing System. The UVASPOT 400T is used in laboratories and in production processes in widely varying sectors of industry for: Hardening UV reactive polyester resins and casting masses (e.g. tanks, containers, pipes and plastic parts). Testing UV resistance of paints, varnishes, textiles and coatings. Fluorescence testing. Hardening UV reactive adhesives (bonding glass, plastic, metal as well as electronic, precision mechanical and optical components). UV radiation in chemical, biological and pharmaceutical research and production. Coating PC boards. Custom cabinet with pull-out tray: 21 in. x 23 in. 230V, 50 Hz, CE.

Karl Suss MJB3-IR Mask Aligner with IR Transmission Alignment for Front or Backside Alignment. Microscope with long working distance objectives. IR transmission alignment system applicable to materials transparent to wavelengths in the range from 400 to 2000nm. The backside alignment is accomplished using an IR camera which detects infrared light transmitted through an IR transparent chuck, as well as the substrate and mask being aligned. The substrate can be exposed in soft or hard contact with both forms of alignment. Also in topside alignment the vacuum contact (high precision HP) is available. 110V, 60 Hz.

Karl Suss MJB3 Mask Aligner. Has backside capability but no IR chuck with unit. Working condition unknown. Sold As Is.

Karl Suss MJB3 Research Mask Aligner. Mask aligner with vacuum contact, proximity or soft contact alignment modes. 365 to 400nm spectral range at up to 350W. High precision X,Y, Theta alignment stage. Normal field microscope. Wafer size from small pieces to 3” dia. 110V, 60 Hz. Ask sales person for available chucks and mask holders.

Karl Suss MJB3 Precision High Performance Mask Alignment and Exposure System. Easy to use manual mask aligner. System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. (Ask a salesperson about available mask and chuck sizes). Hard or soft contact modes. High precision alignment stage X,Y, Theta. Microscope consists of normal field microscope with objective turret for different magnifications. 365 to 400nm spectral range up to 350W. 110V, 60 Hz.

Oriel 87437-1000 UV Flood Exposure System. 500W UV lamp housing operating in the 350 to 450nm spectral region. Beam Size: 8” x 8”. 200-500W Hg arc lamp power supply. System needs new power supply and electronics inside tower. Needs controller upgrade.

AB-M Mask Aligner and UV Exposure System. 350W lamp housing with power supply, currently configure with 200W bulb. Precision alignment stage.
Mask Holder: 4” x 4” with 3” diameter substrate holder. Chuck and mask holder available for 2" substrates also. System will not do larger substrates.
Exposure timer. Splitfield Zeiss microscope for easier alignment. 120V, 50/60 Hz.