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Equipment Details

Inventory Number: 57642
Category: Cleaning Systems
Manufacturer: Semitool STI
Dual Stack Spin Rinse Dryer. High performance wafer cleaning system. Currently configured with rotors for 4 in. wafer cassettes. Used DI water spray to rinse wafers as they spin and uses nitrogen to dry wafers. 120V, 60 Hz.
Now (USD): $11,000.00

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CO2 Precision Surface Cleaning System. For removing micron and submicron particulate and organic contamination using carbon dioxide. When aimed at a contaminated surface the CO2 snow particles dislodge particles and remove thin film organic residues. Removing post-etch veils by momentum transfer or metal lift-off by thermal contraction and momentum transfer. Removes organic film by solvation. Cassette to cassette operation.

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