Used Reynolds Tech Stainless Process Hood

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Stainless Process Hood

Equipment Details

Inventory Number: 64989
Category: Photoresist: Coaters - Tracks
Manufacturer: Reynolds Tech

Reynolds Tech Stainless Steel Process Bench with Photoresist Spinner. Six foot Stainless process hood set up for photoresist coating and developing. Includes Headway CB15 photoresist spinner with PWM50 programmable controller. Tank #1 8.5"W x 8.5"L x 11"D Polyethylene construction. Tank #2 8.5"W x 8.5"L x 11"D Stainless construction. Tank #3 8.5"W x 8.5"L x 11"D Stainless construction. Tank#4 8.5"W x 8.5"L x 10"D Polyethylene cascading Rinse. Large water sink. Large Recessed area for hot plates or other electronics 12"W x 19"L x 6"D. Overall bench dimensions 72"L x 32"W x 76"H

Now (USD): $12,000.00

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Used Integrated Solutions OPTITRAC

Inventory Number: 64397
Now (USD): $10,000.00

Integrated Solutions OPTITRAC 6" Photoresist Developer Track. Developer track is currently configured for 6" wafers. System configured with two elevators, 2 standard bake stations, 2 vented bake stations and one developer spinner station. System came out of a running facility. We are selling this as is with a 30 day right to return.

Product Details

Used CEE Brewer Science 1100FX

Inventory Number: 64584
Now (USD): $5,500.00

The Cee 1100FX Hot Plate is a programmable hotplate for baking resists coated on samples.  There are 10 user programs available which contain preset values for bake Ramp/Soak temperatures, bake time and bake method.  The bake method options are proximity, soft contact and hard contact.  Hard contact promotes best uniformity and minimizes bowing and warping of substrate.  Proximity bake provides slower heating of substrate which helps reduce blistering and cracking of films with fast drying solvents.  A recommended method is to use proximity bake as prebake and followed up by hard contact bake.  Each program allows up to three consecutive bake methods for maximum control of substrate warm up, solvent drying and resin curing characteristics. 

Specifications:
Bake temperature: 300 degrees C maximum
Bake temparature resolution:  1 degree C.
Substrate size: 150 to 300mm

240V, 1Ph,60Hz

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