Equipment Photos

Equipment Details

Inventory Number: 61548
Category: Sputtering Systems
Manufacturer: Miscellaneous

Magnetron Cathode. Target Area: 4.75 in. x 11.75 in.

Now (USD): $500.00

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Used Gencoa Planar Magnetron Cathode

Inventory Number: 56694
Now (USD): $7,500.00

Target Area: 29-1/2 in. x 4-7/8 in. Gas input. With cart for maintenance of cathode.

Product Details

Used Gencoa Planar Magnetron Cathode

Inventory Number: 56692
Now (USD): $7,500.00

Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

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Used Anatech Hummer X

Inventory Number: 57121
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR ANATECH SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Cold Deposition/Etch Sputter Coater for SEM Sample Preparation. Does not have thickness monitoring crystal. Magnetically enhanced sputter head minimizes sample heating. Etch and plasma mode for removal of organic surface contamination. Automatic slow venting at termination of process. Built-in pump. Sample stage accommodates up to 3 in. dia. substrate or 12 SEM stubs. Does not come with gold target. 115V, 60 Hz, 4A.

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Used Denton Vacuum Desk II

Inventory Number: 56176
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR DENTON VACUUM SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Cold Sputter and Etch System for Coating SEM Samples. Self contained cool sputter coater. Automatic or manual operation. Magnetron sputterhead. 6 in. dia. pyrex chamber. Sputtering and etch modes. Uses foil targets that can be changed in minutes (no target with unit). 120V, 60 Hz.

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Used MRC 943

Inventory Number: 57748
Now (USD): $145,000.00

Down Sputter System. Fully automated controlled system. Recipe storage. Hi-Vac and heat load lock with CTI pump. CTI cryo pumped main chamber. 10 kW DC supply. MRC 1.5 kW RF power supply. RF etch. Three RF/DC Planer cathodes. System will have a major PM performed and will be fully operational to the original OEM spec's.

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Used CPA V2000

Inventory Number: 57052
Now (USD): $119,000.00

Five Target RF and DC Magnetron In Line Sputtering System. Currently configured for single sided sputtering but cathodes can be moved manually if double sided sputtering is desired. Target Size: 3-1/2 in. x 18 in. Easy access to cathodes via hinged doors. Currently configured with 4 DC and 1 RF cathodes. Multiple CTI cryopumps for high vacuum. Load lock chambers on both ends. Loader handles up to 28 20 in. H panels or pallets. Variable speed pallet transport system. Tested: $119,000. As Is Untested: $69,000.

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Used KDF 744i

Inventory Number: 59080
Now (USD): Contact for Price

Four Target Batch-Inline Sputtering System. The KDF 744i features full 200mm wafer capability. Using a pallet size of 19 in. x 19 in. a host of substrate sizes can be accommodated with this system. As in all inline KDF systems the user can easily change substrate sizes at will run to run. The 744i system also utilizes KDF’s family of in-house designed cathodes which cover the full spectrum of materials to be sputtered from dielectrics, magnetic materials to precious metals, KDF has a cathode to fit. The KDF 744i is equipped with all the latest in OEM technology like MKS cluster gauges and Advanced Energy pulsed power supplies. The advanced software features of the tool with a Windows 7® HMI are extensive including but not limited to auto cryo regeneration, auto pump and vent, programmable target burn-in, particle test mode, selectable slew modes, multi servo power mode selections, scan profile mode, multipass up to 9999 and repeat recipe mode.

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Used Edwards Auto 500 Turbo

Inventory Number: 60795
Now (USD): $45,000.00

Sputtering System. The Auto 500 box chamber system is a versatile front loading thin film system for Research & Development or preproduction.  The chamber is mounted on a pedestal, housing the pumping stack. A rack panel next to the vacuum pedestal houses controls for vacuum and all thin film processes accessories. Three RF magnetron cathodes, two are 4 in. dia. and one is 3 in. dia.  Rotating Substrate Carrier: 11 in. dia.  Includes RF etch.  Crystal film thickness monitor.  Turbo pump with controller and roughing pump.

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Used Denton Vacuum Explorer 14

Inventory Number: 61455
Now (USD): $21,500.00

DC Sputtering System. Chamber: 12 in. dia. x 18 in. H glass Pyrex bell jar with guard. 15-inch dia. baseplate/pumping plenum assembly supported by system cabinet. System mounted on casters. Pumping System: Turbomolecular pump, LN2 trap located beneath high vacuum poppet valve and manual fill via external funnel. Alcatel 2010 two stage, rotary vane pump. Sputter Source: (1) DSM-300A cold sputter module. 300W DC power supply, 4-inch dia. magnetron sputter source with Denton Vacuum patented ANODE GRID® for maximum electron capture and minimal specimen heating. Variable source to substrate distance. Substrate Fixturing: 8.0 in. Omni rotating fixture plate, speed adjusts via input to system touch screen. Air operated shutter. Control System: The Explorer 14 system is semiautomatic and is controlled by a DL205 CPU from Automationdirect. The operator interface is a touch panel with graphical interface to the PLC. Graphical interface is supported with Automationdirect software. Manual operation of valves, pumps, low voltage sources and fixture rotation subsystems is through this graphical interface. Semiautomatic processes are also operated through this interface.

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Used Edwards Auto 500

Inventory Number: 61707
Now (USD): $25,000.00

Deposition System with Low Temp Organic Source and Resistive Evaporation. Front loading thin film deposition system for research and development or pre-production. System has a total of three evaporation sources, two standard resistive sources and one Kurt J. Lesker low temperature source for organics. Dual crystal deposition film thickness monitor. Substrate rotation controller. Single shudder. Controller for substrate heat but does not have heaters. Dry scroll pump in base for chamber roughing. CTI cryopump with compressor for high vacuum pump down. CE marking. System can deposit one source at a time or can do codeposition.

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