Equipment Photos

Equipment Details

Inventory Number: 61528
Category: Sputtering Systems
Manufacturer: International Scientific Instruments

Sputter Coater. Simple manual sputter coater for SEM samples. Includes external vacuum pump. No gold target with system.

Now (USD): $1,950.00

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Used Labsphere LPS-200-H

Inventory Number: 51988
Now (USD): $395.00

Halogen Lamp Source and Power Supply. 200W output. 120/240V, 50/60 Hz.

Product Details

Used PVA Tepla PS-210

Inventory Number: 60348
Now (USD): $35,000.00

Microwave Plasma Surface Treatment Etch System. The Microwave Plasma System 210 is ideal for: Plasma surface modification. Plasma cleaning of organic surfaces. Bond strength enhancement. Plasma etch applications. Plasma asher applications. Increased or decreased wettability. Any other plasma system application.

Controller: Windows® O/S based touchscreen interface offering fully automatic control. Multi-step recipes, real time graphic display, multi-level password access, data logging, and real time SPC monitoring of all plasma parameters is provided. Microwave Power. Display: Color 10.4-inch touch screen for control and monitoring of process parameters, automatic recipes, or manual plasma treatments.

Quartz Chamber: 9.5 in. dia. x 9 in. Four process gas inputs.  Previous Gases Used: O2, CF4, N2, AR. Includes vacuum pump. 230V, 1 Ph, 50/60 Hz, CE.

Product Details

Used Gencoa Planar Magnetron Cathode

Inventory Number: 56694
Now (USD): $7,500.00

Target Area: 29-1/2 in. x 4-7/8 in. Gas input. With cart for maintenance of cathode.

Product Details

Used Gencoa Planar Magnetron Cathode

Inventory Number: 56692
Now (USD): $7,500.00

Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

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Used Anatech Hummer X

Inventory Number: 57121
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR ANATECH SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Cold Deposition/Etch Sputter Coater for SEM Sample Preparation. Does not have thickness monitoring crystal. Magnetically enhanced sputter head minimizes sample heating. Etch and plasma mode for removal of organic surface contamination. Automatic slow venting at termination of process. Built-in pump. Sample stage accommodates up to 3 in. dia. substrate or 12 SEM stubs. Does not come with gold target. 115V, 60 Hz, 4A.

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Used Denton Vacuum Desk II

Inventory Number: 56176
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR DENTON VACUUM SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Cold Sputter and Etch System for Coating SEM Samples. Self contained cool sputter coater. Automatic or manual operation. Magnetron sputterhead. 6 in. dia. pyrex chamber. Sputtering and etch modes. Uses foil targets that can be changed in minutes (no target with unit). 120V, 60 Hz.

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Used MRC 943

Inventory Number: 57748
Now (USD): $145,000.00

Down Sputter System. Fully automated controlled system. Recipe storage. Hi-Vac and heat load lock with CTI pump. CTI cryo pumped main chamber. 10 kW DC supply. MRC 1.5 kW RF power supply. RF etch. Three RF/DC Planer cathodes. System will have a major PM performed and will be fully operational to the original OEM spec's.

Product Details

Used CPA V2000

Inventory Number: 57052
Now (USD): $119,000.00

Five Target RF and DC Magnetron In Line Sputtering System. Currently configured for single sided sputtering but cathodes can be moved manually if double sided sputtering is desired. Target Size: 3-1/2 in. x 18 in. Easy access to cathodes via hinged doors. Currently configured with 4 DC and 1 RF cathodes. Multiple CTI cryopumps for high vacuum. Load lock chambers on both ends. Loader handles up to 28 20 in. H panels or pallets. Variable speed pallet transport system. Tested: $119,000. As Is Untested: $69,000.

Product Details

Used KDF 744i

Inventory Number: 59080
Now (USD): Contact for Price

Four Target Batch-Inline Sputtering System. The KDF 744i features full 200mm wafer capability. Using a pallet size of 19 in. x 19 in. a host of substrate sizes can be accommodated with this system. As in all inline KDF systems the user can easily change substrate sizes at will run to run. The 744i system also utilizes KDF’s family of in-house designed cathodes which cover the full spectrum of materials to be sputtered from dielectrics, magnetic materials to precious metals, KDF has a cathode to fit. The KDF 744i is equipped with all the latest in OEM technology like MKS cluster gauges and Advanced Energy pulsed power supplies. The advanced software features of the tool with a Windows 7® HMI are extensive including but not limited to auto cryo regeneration, auto pump and vent, programmable target burn-in, particle test mode, selectable slew modes, multi servo power mode selections, scan profile mode, multipass up to 9999 and repeat recipe mode.

Product Details

Used Edwards Auto 500 Turbo

Inventory Number: 60795
Now (USD): $45,000.00

Sputtering System. The Auto 500 box chamber system is a versatile front loading thin film system for Research & Development or preproduction.  The chamber is mounted on a pedestal, housing the pumping stack. A rack panel next to the vacuum pedestal houses controls for vacuum and all thin film processes accessories. Three RF magnetron cathodes, two are 4 in. dia. and one is 3 in. dia.  Rotating Substrate Carrier: 11 in. dia.  Includes RF etch.  Crystal film thickness monitor.  Turbo pump with controller and roughing pump.

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