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Equipment Details

Inventory Number: 57801
Category: Exposure - Mask Aligners - UV Curing
Manufacturer: Karl Suss

Mask Aligner with Manual Substrate Handling. Contact or proximity mask aligner. Manual substrate loading of wafers, partial wafers, substrate and special material processing. Lamp housing and power supply capable of using UV lamps up to 1000W 365-400nm. Capable of exposing substrates up to 150mm with appropriate chuck and mask option. Currently configured for 4 in. dia. wafers. Call for As Is price.

Now (USD): $39,000.00

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Product Details

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Product Details

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THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR KARL SUSS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Mask Aligner with Backside and Topside Alignment Capabilities. The scanning backside alignment is accomplished using an IR camera which detects infrared light transmitted through an IR transparent chuck, as well as the substrate and mask being aligned. The alignment microscope uses 5X, 10X and 20X objective lenses for either backside or topside alignment. For topside alignment the eyepieces are 12.5X. The exposure source is a 350W Hg lamp powered by a Suss Model 505 supply. The system incorporates UV-400 optics to transfer the energy to the substrate. The substrate may be exposed in soft or hard contact with both forms of alignment. Also in topside alignment the vacuum contact (high precision “HP”) is available.

Product Details

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Product Details

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