Bid Service, LLC 225 Willow Brook Rd. Freehold, NJ 07728
Phone: 732-863-9500 Fax: 732-863-1255
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PVA TEPLA ION 100/40Q WB Plasma Barrel Asher. Quartz Barrel photoresist asher and plasma surface treatment system. The Photoresist Ashing IoN 100-40Q Plasma System is a barrel plasma reactor designed for high volume production applications.
Material: Quartz chamber Dimensions: 304 mm D x 508 mm L (12”X20”) Volume: 37 L (1.31 ft3) Chamber Opening: 289.56 mm (11.4”) Electrodes: Clam-shell Number of MFCs: 3 Process Pressure: (0.16 to 2.66) mbar (120 to 2000) mTorr Base Pressure: 0.07 mbar (50 mTorr) Pumping Time: 1 min (Pump dependent) Wafer Sizes: Up to 200 mm (8”) Batch size (Boat): 25 wafers of diameter 200 mm (8”) 50 wafers of diameter 150 mm (6”) Wafer Loading: Manual Plasma Source Frequency/power: 13.56 MHz/600 W
March Instruments PX 1000E8 Plasma Asher/Etcher with Pneumatic Vertical Door. Batch system for plasma cleaning or etching. Currently configured with vertical shelves: 18 in. x 6 in. RFX 600 13.56 MHz RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required. Shelves are mounted vertically from top to bottom. Not standard horizontal mounting.
Anatech SP100 Table Top Plasma System. For plasma cleaning of small parts or for modifying surfaces. Digital countdown timer. Analog pressure display. Gas flow with needle valve control. RF Power Source: 100W at 13.56 MHz. Quartz Chamber: 4 in. x 8 in. Includes vacuum pump. 110V, 60 Hz, 10A.
Plasmatherm SLR-720/720 Dual Chamber RIE Reactive Ion Etch System. PC controller with graphical user interface. Dual chamber unit with robot loader. Was lasted used to process 4" wafers. RF5S 500W, 13.56 MHz RF Generator. Comes with a Turbo pump but does not come with roughing pump. Currently confi gured with nine MFC. 208V, 3 Ph, 60 Hz. Sold as is where is untested at this price.