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Equipment Details

Inventory Number: 64060
Category: Power Supplies - RF-Plasma-E-Gun
Manufacturer: Inficon

Inficon IC5 Thin Film Deposition Controller. Model IC5-21111. The IC/5 is a closed loop process controller designed for use primarily in physical vapor deposition. The unit monitors and/or controls the rate and thickness of the deposition of thin films. Deposition rate and thickness are inferred from the frequency change induced by mass added to a quartz crystal( not included- controller only) The change in frequency provides information to determine rate and thickness and to continually control the evaporation power source. With user supplied time, thickness and power limits and with desired rates and material characteristics, the unit is capable of automatically controlling the process in a precise and repeatable manner. User interaction is accomplished via the unit's front panel and consists of selection or entry of parameters to define the process. 120V, 50/60 Hz,4A, CE

Now (USD): $5,500.00

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Inficon IC5 Thin Film Deposition Controller. Model IC5-21111. The IC/5 is a closed loop process controller designed for use primarily in physical vapor deposition. The unit monitors and/or controls the rate and thickness of the deposition of thin films. Deposition rate and thickness are inferred from the frequency change induced by mass added to a quartz crystal( not included- controller only) The change in frequency provides information to determine rate and thickness and to continually control the evaporation power source. With user supplied time, thickness and power limits and with desired rates and material characteristics, the unit is capable of automatically controlling the process in a precise and repeatable manner. User interaction is accomplished via the unit's front panel and consists of selection or entry of parameters to define the process. 120V, 50/60 Hz,4A, CE

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Inventory Number: 64059
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Inficon IC5 Thin Film Deposition Controller. Model IC5-21111. The IC/5 is a closed loop process controller designed for use primarily in physical vapor deposition. The unit monitors and/or controls the rate and thickness of the deposition of thin films. Deposition rate and thickness are inferred from the frequency change induced by mass added to a quartz crystal( not included- controller only) The change in frequency provides information to determine rate and thickness and to continually control the evaporation power source. With user supplied time, thickness and power limits and with desired rates and material characteristics, the unit is capable of automatically controlling the process in a precise and repeatable manner. User interaction is accomplished via the unit's front panel and consists of selection or entry of parameters to define the process. 120V, 50/60 Hz,4A, CE

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