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Equipment Details

Inventory Number: 63009
Category: Sputtering Systems
Manufacturer: Kurt J. Lesker

Kurt J. Lesker CMS-18 Six Target Load Locked RF DC Sputtering System. Dual chamber with load lock. Three cathodes in each chamber for total of six cathodes. PLC Process control (programmable depositions). Substrates up to 8 in. dia. Substrate rotation. Substrate bias, RF and DC. Substrate heater up to 500 deg C. 3-inch Magnetron sputter cathodes. Process Gases: Ar, O2, N2. RF and DC power supplies. CALL FOR PRICE.

NOT RECENT PHOTO MISSING RFX-600, ATX-600 AND TWO TURBO CONTROLLERS

Now (USD): Contact for Price

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