Equipment Photos

Equipment Details

Inventory Number: 90141
Category: Exposure - Mask Aligners - UV Curing
Manufacturer: OAI

OAI Optical Associates Model 208S Mask Aligner and Exposure System with 2000W NUV light source. The Model 208S can handle up to 8” round wafers and 8” x 8” square substrates (or displays) with the appropriate mask and chuck set.

Now (USD): $59,000.00

Products Similar to: OAI 208S

Used Tamarack 152R 1000-9

Inventory Number: 56757
Now (USD): $21,500.00

Tamarack 152R 1000-9 Mask Alignment and Exposure System. Split field alignment with twin video cameras equipped with zoom lenses. Controlled collimation exposures. Nitrogen purge. Proximity printing. Soft contact control. Currently configured with 3-3/8 in. x 3-3/8 in. vacuum chuck and 5 in. mask. Other sizes can be purchased from manufacturer. 500/1000W UV light source. 115V, 60 Hz.

Product Details

Used Tamarack 152P/162

Inventory Number: 56766
Now (USD): $14,950.00

Tamarack 152P/162 Projection Mask Aligner. For thin film alignment and expose on ceramic, silicon, metal or glass substrates with diagonals or diameters of up to 6 in. Through-the-lens alignment. 4 to 8 mils depth of focus. 1:1 projection. 1000W lamp maximum. Wavelength Range: 350 to 450nm. Resolution: 15 to 25 microns. No lamp power supply.

Product Details

Used Thermo Oriel Accudose 9000

Inventory Number: 53217
Now (USD): $12,500.00

Thermo Oriel Accudose 9000 Photospeed Tool. Measures batch to batch photospeed variations. Photoresist testing system. Oriel part 83995 near UV system with fast shutter. Assures that exposure dosage is in-line with your process window requirements. No need to sideline your expensive stepper for photoresist testing. Provides accurate, incremented bulk area exposures across a wafer. Use it to quantify threshold exposure, spectra variations, find potential resist problems and verify lot to lot consistency.

Product Details

Used Karl Suss MJB3

Inventory Number: 59511
Now (USD): $29,000.00

Karl Suss MJB3 Standard Mask Aligner. System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. Ask salesperson about available chucks and sizes. Hard or soft contact modes. 365nm to 400nm spectrum of a 200W high pressure arc lamp. Alignment optics consist of normal field microscope with objective turret for different magnifications. 110V, 60 Hz.

Product Details

Used Honle UVASPOT 400T

Inventory Number: 59766
Now (USD): $3,950.00

Honle UVASPOT 400T High Powered Ultra-Violet UV Curing System. The UVASPOT 400T is used in laboratories and in production processes in widely varying sectors of industry for: Hardening UV reactive polyester resins and casting masses (e.g. tanks, containers, pipes and plastic parts). Testing UV resistance of paints, varnishes, textiles and coatings. Fluorescence testing. Hardening UV reactive adhesives (bonding glass, plastic, metal as well as electronic, precision mechanical and optical components). UV radiation in chemical, biological and pharmaceutical research and production. Coating PC boards. Custom cabinet with pull-out tray: 21 in. x 23 in. 230V, 50 Hz, CE.

Product Details

Used Honle UVASPOT 400T

Inventory Number: 59767
Now (USD): $3,950.00

Honle UVASPOT 400T High Powered Ultra-Violet UV Curing System. The UVASPOT 400T is used in laboratories and in production processes in widely varying sectors of industry for: Hardening UV reactive polyester resins and casting masses (e.g. tanks, containers, pipes and plastic parts). Testing UV resistance of paints, varnishes, textiles and coatings. Fluorescence testing. Hardening UV reactive adhesives (bonding glass, plastic, metal as well as electronic, precision mechanical and optical components). UV radiation in chemical, biological and pharmaceutical research and production. Coating PC boards. Custom cabinet with pull-out tray: 21 in. x 23 in. 230V, 50 Hz, CE.

Product Details

Used Karl Suss MJB3-IR

Inventory Number: 60885
Now (USD): $49,000.00

Karl Suss MJB3-IR Mask Aligner with IR Transmission Alignment for Front or Backside Alignment. Microscope with long working distance objectives. IR transmission alignment system applicable to materials transparent to wavelengths in the range from 400 to 2000nm. The backside alignment is accomplished using an IR camera which detects infrared light transmitted through an IR transparent chuck, as well as the substrate and mask being aligned. The substrate can be exposed in soft or hard contact with both forms of alignment. Also in topside alignment the vacuum contact (high precision HP) is available. 110V, 60 Hz.

Product Details

Used Karl Suss MJB3

Inventory Number: 61055
Now (USD): $25,000.00

Karl Suss MJB3 Precision High Performance Mask Alignment and Exposure System. Easy to use manual mask aligner. System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. (Ask a salesperson about available mask and chuck sizes). Hard or soft contact modes. High precision alignment stage X,Y, Theta. 365 to 400nm spectral range up to 350W. 110V, 60 Hz.

Product Details

Used Karl Suss MJB3

Inventory Number: 61456
Now (USD): $15,000.00

Karl Suss MJB3 Mask Aligner. Has backside capability but no IR chuck with unit. Working condition unknown. Sold As Is.

Product Details

Used OAI Hybralign 400

Inventory Number: 61776
Now (USD): $19,500.00

OAI Hybralign 400 Large Area Mask Aligner and Exposure System. Combines a precision mask to substrate alignment stage with a uniform, high intensity UV lightsource. System is very versatile. Splitfield microscope. UV power supply and exposure timer. 365/400 nm optics with a final lense diameter of 10 in.  115V, 50/60 Hz.

Product Details