New Arrivals

Neslab RTE 740 Low Temperature Refrigerated and Heating Bath Circulator Chiller. Temperature Range: -40°C to 200°C. Digital Plus Controller. Cooling Capacity: 800W at 20°C. Pumping Capacity: 15 lpm at O’Head. Nitrogen purge port. LED controller. 115V, 1 Ph, 60 Hz, 16A, CE.

Nikon UM-3 Measuring Microscope with X-Y Digital Readout & Top & Bottom Illumination. Eyepieces: 10X. Objective: 5X, 10X, 20X. Stage Size: 18” x 10”. Stage Movement: 7” x 3”. Brightfield and Darkfield. Transmitted/Reflected Light. Halogen Illuminator.

Nikon Optiphot 150S Nomarski 1000X Microscope. Microscope has Nomarski optics on all objectives except for the 5X. Objectives on the scope 5x, 10x, 20x, 50x, 100x. 10X eyepieces. New camera and monitor. Stage travel of 6" x 6" with a substrate holder for 2" through 5" substrates. 110V, 50/60Hz

Stainless Steel Double Stack Nitrogen Dry Box. Desiccator box with overall dimensions of 29.5"W x 25"D x 66"H and each cabinet has an inside dimensions of 29"W x 24"D x 32"H

OnTrak DSS-200 CMP Double Sided Brush Cleaner. Double sided wafer cleaner for post CMP cleaning. The DSS-200 scrubs, rinses and dries 4”, 6” or 8” (100, 150 or 200mm) wafers. System is currently configured for 6" by 6" squares. Parts needed to change sizes. Consists of system electronics, a send indexer, a brush cleaning station, spin station and robotic edge handling receive indexer. Wafers are DI sprayed while in sender, moved to brush stations where they are cleaned by top and bottom brushes with DI and/or cleaning chemistry. In spinning station they are DI rinsed and dried. CE marking.

Para Tech LabTop 3000 Compact Bench Top Parylene Conformal Coating System. The compact LabTop by Para Tech is designed for coating small substrates and modules in laboratory, R&D and short run production settings. Its 8” by 9” stainless steel chamber can also accommodate larger devices for prototyping and research and development applications. Features the same automated process features and vacuum coating precision as full size Para Tech coating systems. Ideal for application development as well as short run production coating of printed circuit boards, medical components, electronic sensors and other small substrates. Tangential entry and exit of the polymerizing monomer results in an extremely low coating thickness gradient as well as superior film uniformity. Produces very thin Parylene film for optical applications and microwave components.  CE compliant.

Pfeiffer TPH 180HU Turbo Pump With TCP 380 Controller and Cables. DN 100 ISO-K Flange, 180L/S Pumping Speed, 100-240V, 50/60Hz.7 Available

Plasmatherm SLR ICP Shuttle Lock ICP Inductively Coupled Plasma Etch System. PC controller. Vacuum load lock with wafer transfer robot. Can process wafers from 2” to 8” depending on which process kit is installed. Currently configured with 4” kit.  High frequency RF-based inductively coupled plasma source capable of high density plasma generation. Closed loop pressure control. Turbo pump with roughing pump. Total of eight MFC gas controllers. Includes water chiller and roughing pump. 208V, 3Ph, 60Hz

Polycold PFC-550LT Fast Cycle Water Vapor Cryochiller. The Polycold Fast Cycle Water Vapor Cryochillers (PFC) effectively captures water vapor, which comprises 65% to 95% of the residual gas in high-vacuum systems. Water vapor is typically the most reactive contaminant present. With the PFC cryochillers, you can expect to increase product throughput in your existing system 20% to 100% and improve quality of deposition. Sold AS IS with no refrigeration charge.