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Used Oriel 92530-1000

Inventory Number: 59105
Now (USD): $25,000.00

Mask Aligner with UV Exposure Tower and Split Field Alignment Microscope. Photolithography system. Model 92530-1000 UV exposure source. 350 to 450nm wavelength and up to 1000W UV lamp. Flux density of up to 430W m^-2. Model 83210-V contact and proximity alignment fixture for substrates up to 6 in. x 6 in. and 7 in. x 7 in. masks. Split field alignment microscope for easier faster alignment. 220V, 50/60 Hz, CE.

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