Equipment Photos

Equipment Details

Inventory Number: 59368
Category: Exposure - Mask Aligners - UV Curing
Manufacturer: Ultron

UV Film Curing System. Easy to use benchtop system for curing UV adhesive films. Used in mounting substrate prior to dicing or scribing. Programmable microprocessor based controller. Currently configured with plate with a 6.5 in. opening for UV light. Can accommodate up to 8 in. wafers if this plate is changed. 115V, 60 Hz, 10A.

Now (USD): $5,500.00

Products Similar to: Ultron UH 102-8

Used Ultron UH 102-8

Inventory Number: 51011
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR ULTRON SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * UV Curing System. For the curing of UV films. Nitrogen blanket to assure complete curing of the UV adhesive. Microprocessor-based programmable controller. Accepts wafers and film frames up to 8 in. 115V, 60 Hz, 10A.

Product Details

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Inventory Number: 49743
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UV Exposure Meter. Provides key exposure measurements of energy intensity and time. 120V, 60 Hz.

Product Details

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Product Details

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Cassette to Cassette UV Flood Exposure System. System includes a UV light source, intensity controlling power supply and robotic substrate handling subsystem. PC controller. 500W NUV Lamp House: 360-440 nm. 5 in. dia. collimated lense. 120V, 50/60 Hz.

Product Details

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Inventory Number: 54130
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Cassette to Cassette UV Flood Exposure System. System includes a robotic substrate handling system, UV lamp housing and intensity controlling power supply. Lamp housing will support up to 1000W lamp. Configured for 365 to 400 nm. Max. Exposure Area: 6 in. dia. 120V, 60 Hz.

Product Details

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Inventory Number: 56345
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Mask Aligner. Resolution into the submicron region. Silicon and compound semiconductor wafers up to 150mm dia. Wafer size determined by mask and chuck size chosen. Ask salesman for sizes available. Split field alignment microscope. CIC500 500W lamp power supply. Wavelength: 360nm to 400nm. Currently configured for topside alignment only.

Product Details

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Neutronix Remanufactured Manually Loaded Mask Aligner. Parallel light mask aligner. Can be configured for proximity or contact alignment. 4-1/4 in. x 4-1/4 in. square vacuum chuck. Manual load station for wafers up to 4 in. dia. 250W lamp. 115V, 60 Hz. Sold As Is. Not tested.

Product Details

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Inventory Number: 56757
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Mask Alignment and Exposure System. Split field alignment with twin video cameras equipped with zoom lenses. Controlled collimation exposures. Nitrogen purge. Proximity printing. Soft contact control. Currently configured with 3-3/8 in. x 3-3/8 in. vacuum chuck and 5 in. mask. Other sizes can be purchased from manufacturer. 500/1000W UV light source. 115V, 60 Hz.

Product Details