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Equipment Details

Inventory Number: 55693
Category: Plasma Etchers - Ashers - Ion Mills
Manufacturer: Oxford
Turbopumped Reactive Ion Etch RIE System. PC controller with graphical user interface. Excellent across chamber uniformity. 500W, 13.56 MHz RF generator. Turbopumped chamber, includes roughing pump. Four gas inputs controlled via MFC. Previous gas used SF, O2, CHF3, N2. Shower head gas delivery method.
Now (USD): $75,000.00