Bid Service, LLC 225 Willow Brook Rd. Freehold, NJ 07728
Phone: 732-863-9500 Fax: 732-863-1255
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Used on Canon PLA-501 Series mask aligners.
UV Conveyor System. Fast curing of UV adhesives and potting materials. 220V, 50 Hz only.
UV Exposure Meter. Provides key exposure measurements of energy intensity and time. 120V, 60 Hz.
Flexicure UV Adhesive Curing System. Developed to accelerate the curing process of UV adhesives for component bonding, sealing and protection. 2 outputs but only 1 flexible cable.
Cassette to Cassette UV Flood Exposure System. System includes a UV light source, intensity controlling power supply and robotic substrate handling subsystem. PC controller. 500W NUV Lamp House: 360-440 nm. 5 in. dia. collimated lense. 120V, 50/60 Hz.
Cassette to Cassette UV Flood Exposure System. System includes a robotic substrate handling system, UV lamp housing and intensity controlling power supply. Lamp housing will support up to 1000W lamp. Configured for 365 to 400 nm. Max. Exposure Area: 6 in. dia. 120V, 60 Hz.
Measurement Station. More information to come contact us for details.
Mask Aligner. Resolution into the submicron region. Silicon and compound semiconductor wafers up to 150mm dia. Wafer size determined by mask and chuck size chosen. Ask salesman for sizes available. Split field alignment microscope. CIC500 500W lamp power supply. Wavelength: 360nm to 400nm. Currently configured for topside alignment only.
Neutronix Remanufactured Manually Loaded Mask Aligner. Parallel light mask aligner. Can be configured for proximity or contact alignment. 4-1/4 in. x 4-1/4 in. square vacuum chuck. Manual load station for wafers up to 4 in. dia. 250W lamp. 115V, 60 Hz. Sold As Is. Not tested.
Mask Alignment and Exposure System. Split field alignment with twin video cameras equipped with zoom lenses. Controlled collimation exposures. Nitrogen purge. Proximity printing. Soft contact control. Currently configured with 3-3/8 in. x 3-3/8 in. vacuum chuck and 5 in. mask. Other sizes can be purchased from manufacturer. 500/1000W UV light source. 115V, 60 Hz.
Projection Mask Aligner. For thin film alignment and expose on ceramic, silicon, metal or glass substrates with diagonals or diameters of up to 6 in. Through-the-lens alignment. 4 to 8 mils depth of focus. 1:1 projection. 1000W lamp maximum. Wavelength Range: 350 to 450nm. Resolution: 15 to 25 microns.
Note: All manufacturers names and models are used for illustrative purposes only. Any trademarks, tradenames or copyrights remain solely the property of the manufacturers. Unless otherwise stated, all items are used, and Bid Service,LLC is not a manufacturer authorized representative. All images are the property of Bid Service, LLC and may not be used for any purpose without prior written permission.