Refurbished with a 30 Day Right of
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Used
ANATECH
HUMMER VI-A
Cold Deposition/Etch Sputter Coater with Carbon Accessory.
Cold planar magnetron sputtering.
Microscope stub holder accommodates up to 3.25 in. dia. substrates.
Self contained two stage vacuum pump.
Carbon evaporation accessory.
Does not have deposition monitor, operates on timed mode.
115V, 60 Hz, 6A. No Gold Target.
Inventory#:
55453
Used
EMITECH
K550X
Sputter Coater.
LCD display of parameters.
Single cathode system 60 mm dia.
Specimen Stage: 60 mm dia.
No target with system.
Includes vacuum pump.
Inventory#:
54983
Used
EMITECH
K650X
Large Sample Sputter Coater.
Triple target sputtering (3 x 80 mm dia.).
No gold targets with system. LCD display of parameters.
Low energy cool system.
Rotating specimen stage: 155 mm dia.
Includes vacuum pump.
Inventory#:
54982
Used
ION BEAM SPUTTER TARGET
-
Target rotation system for ion beam sputtering system.
Holds four 6 in. dia. targets. 10 in. ISO flange.
Synchronous stepping motor, no controller.
Length from flange to end of target 20 in.
Inventory#:
50679
Used
MRC
603
3 Target RF/DC Sputtering System with RF Etch
and Load Lock Chamber.
System upgraded to PC controller capable of RF or DC sputtering but currently configured with three 4-3/4 in. x 14-7/8 in. DC cathodes. RF etch platform. 3 gas inputs controlled by MFC, previous gas used: O2, N2, AR. Advanced Energy MDX DC power supply. CTI-8 cryopump with compressor and roughing pump. RGA available at additional cost.
Inventory#:
54177
Used
MRC
603
3 Target RF/DC Sputtering System with RF Etch and Load Lock Chamber.
System upgraded to PC controller capable of RF or DC sputtering but currently configured with three 4-3/4 in. x 14-7/8 in. DC cathodes.
RF etch platform. 3 gas inputs controlled by MFC, previous gas used: O2, N2, AR. Advanced Energy MDX DC power supply. CTI-8 cryopump with compressor and roughing pump.
RGA available at additional cost.
Inventory#:
54356
Used
MRC
603-II
Side Sputtering System w/Etch Capabilities.
Currently configured with 3 D.C. Magnetron Cathodes (inset cathodes).
Alcatel 2033 Roughing Pump. CTI-8 Cryopump. 1500W RF Generator.
Automatic or manual controls for vacuum system and sputtering process.
4 process gas capability.
Average cycle time: 13.0 minutes.
Typical target utilization: Ti-W Inset 35 percent, Al Inset 50 percent.
Cathode size: 4-3/4 in. x 14-7/8 in.
Sputter etch: 1.5 kW RF.
CRT screen monitoring, keyboard parameter control, full automation.
With manuals. 208V, 60 Hz, 3 Ph, 110A.
Inventory#:
21983
Used
MRC
943
Sputtering System. More information to come contact us for details.
Current photo for representation only. More photos to come.
Inventory#:
55145
Multiple photos.. 
ANATECH
HUMMER VI-A
Cold Deposition/Etch Sputter Coater with Carbon Accessory.
Cold planar magnetron sputtering.
Microscope stub holder accommodates up to 3.25 in. dia. substrates.
Self contained two stage vacuum pump.
Carbon evaporation accessory.
Does not have deposition monitor, operates on timed mode.
115V, 60 Hz, 6A. No Gold Target.
Inventory#:
55453
Bid-Service
LLC, 225 Willow Brook Road, POB 6729 Freehold, NJ 07728 PHONE:
732-863-9500