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Plasma Etchers - Ashers - Ion Mills
Used Plasma Etchers - Ashers - Ion Mills


Refurbished with a 30 Day Right of Return and 3-Month Warranty! (Unless sold "AS-IS" * )

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Astex  PDS 17 - NEW ARRIVAL!! -- $49,900

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Used  Astex  PDS 17  Diamond Film Coater. PDS-17 plasma deposition system is a complete system with the precision S-1500 microwave power source, all microwave components, the stainless steel reactor chamber with 4 in. usable diameter heater stage mounted on a bellow-sealed motor driven shaft, power supplies, automated gas distribution system, vacuum pumping system and computerized process control and data acquisition. In the high pressure mode the system can be operated between 10 and 100 torr with the heater stage operating above 900 deg C. With these deposition conditions high quality diamond films are produced from hydrogen/methane mixture. At low pressure the source may be operated with a magnetic field for deposition of diamond and Diamond-Like Carbon (DLC). System is controlled by the multitasking computerized control system which permits easy programming for a wide variety of processes. It also includes data logging capability with on-line data trending.     Inventory#: 90023

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Axcelis  Gemini - NEW ARRIVAL!! -- $-

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Used  Axcelis  Gemini  Downstream Asher. More information to come contact us for details.     Inventory#: 58883

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CCR TECHNOLOGY  COPRA DN 160 -- $9,500

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Used  CCR TECHNOLOGY  COPRA DN 160  Inductively Coupled Plasma Source for PECVD, Surface Cleaning, Oxidation, Nitridation and Activation Processes. 8 in. CF single turn ICP RF plasma source head with integral RF Matchbox and Advanced Energy RFX-600 RF generator with Delta Elektronica ES 150W DC power supply 0-15V, 0-10A output. CCU transverse magnetic field control unit to maintain resonance conditions. Capable of forming a quasi-neutral beam with well defined and controlled parameters. Useful for many applications including cleaning, milling, ion assisted deposition, oxygenation, PECVD, surface modifications of plastics, RIE and plasma etch. Delivers very high currents even at very low energies. 120V, 50/60 Hz.     Inventory#: 57328

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GATAN  600 CTMP -- $10,950

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Used  GATAN  600 CTMP  Turbo Pumped Argon/Reactive Plasma DuoMill Dual Station Ion Milling System. Ion milling system for the preparation of high quality TEM specimens. Two independent milling stations mounted on a single high speed vacuum system. Each milling station has a Whisperlok specimen exchange system which functions without disturbing the vacuum or milling conditions of the other station and two Octogun ion guns.     Inventory#: 53783

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HYPERVISION  CHIP UNZIP -- $6,500

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Used  HYPERVISION  CHIP UNZIP  Backside Preparation System. Low stress backside preparation system is useful for the development and analysis of flip-chips, lead-on-chips packaging and advanced chip design with more than 3 metallization layers. Software controlled milling to remove semiconductor packaging materials: epoxy molding compound, ceramic, metal and perform backside thinning on silicon die.     Inventory#: 48882

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MARCH INSTRUMENTS  CS 1701 -- $-

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Used  MARCH INSTRUMENTS  CS 1701  THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR MARCH INSTRUMENTS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Benchtop Reactive Ion Etching System (RIE). Tabletop plasma RIE system. Microprocessor control system provides user with flexibility and ease of use. Four MFC gas inputs. Capable of processing substrates up to 6 in. dia. RF generator 600W, 13.56 MHz. Includes vacuum pump.     Inventory#: 55116

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MARCH INSTRUMENTS  JUPITER II -- $-

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Used  MARCH INSTRUMENTS  JUPITER II  THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR MARCH INSTRUMENTS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Tabletop Reactive Ion Etcher. Parallel plate reactive ion etcher capable of handling up to a 6 in. wafer. 300 Watt 13.56 MHz RF Generator. Currently configured for one process gas and an N2 purge gas. Can be upgraded to handle 4 process gas inputs. With pump.     Inventory#: 38966

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MARCH INSTRUMENTS  PX 1000 -- $32,000

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Used  MARCH INSTRUMENTS  PX 1000  Plasma Etcher/Cleaner. Batch systems for plasma cleaning or etching. Currently configured with only one 17 in. x 14 in. shelf set. Can accommodate multiple shelves. RFX 600 13.56 MHz, 600W RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.     Inventory#: 58161

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MARCH INSTRUMENTS  PX 1000 - NEW ARRIVAL!! -- $32,000

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Used  MARCH INSTRUMENTS  PX 1000  Plasma Etcher/Cleaner. Batch systems for plasma cleaning or etching. Currently configured with only one 17 in. x 14 in. shelf set. Can accommodate multiple shelves. RFX-600 13.56 MHz, 600W RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.     Inventory#: 58787

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MARCH INSTRUMENTS  PX 1000E8 - NEW ARRIVAL!! -- $32,500

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Used  MARCH INSTRUMENTS  PX 1000E8  Plasma Asher/Etcher with Pneumatic Vertical Door. Batch system for plasma cleaning or etching. Currently configured with one shelf set: 17 in. x 14 in. Can accommodate multiple shelves. RFX 600 13.56 MHz RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.     Inventory#: 58786

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MARCH INSTRUMENTS  PX 250 - NEW ARRIVAL!! -- $21,500

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Used  MARCH INSTRUMENTS  PX 250  Plasma Cleaning System. Multiple removable shelves can easily be configured to provide downstream or direct plasma. Shelves: 6 in. x 6 in. 300W, 13.56 MHz RF Generator. Includes vacuum pump. Two MFC gas inputs. Fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. 208/230V, 1 Ph, 50/60 Hz, CE.     Inventory#: 58551

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MARCH INSTRUMENTS  PX 250 - NEW ARRIVAL!! -- $21,500

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Used  MARCH INSTRUMENTS  PX 250  Plasma Cleaning System. Multiple removable shelves can easily be configured to provide downstream or direct plasma. Shelves: 6 in. x 6 in. 300W, 13.56 MHz RF Generator. Includes vacuum pump. Two MFC gas inputs. Fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. 208/230V, 1 Ph, 50/60 Hz, CE.     Inventory#: 58552

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MARCH INSTRUMENTS  PX 250 - NEW ARRIVAL!! -- $21,500

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Used  MARCH INSTRUMENTS  PX 250  Plasma Cleaning System. Multiple removable shelves can easily be configured to provide downstream or direct plasma. Shelves: 6 in. x 6 in. 300W, 13.56 MHz RF Generator. Includes vacuum pump. Two MFC gas inputs. Fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. 208/230V, 1 Ph, 50/60 Hz, CE.     Inventory#: 58767

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MARCH INSTRUMENTS  PX 500 -- $29,500

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Used  MARCH INSTRUMENTS  PX 500  Batch Plasma Treatment System. Gas plasma treatment provides a fast efficient method for surface treatment and cleaning. Automatic process control of vacuum and gas flow, chamber pressure, power level and endpoint. Configured for 2 process gas and N2. 13.56 MHz RF generator. Two electrodes 8 in. x 13 in. Includes vacuum pump.     Inventory#: 57071

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MARCH INSTRUMENTS  PX 500 -- $29,500

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Used  MARCH INSTRUMENTS  PX 500  Batch Plasma Treatment System. Provides a fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. Automatic process control of vacuum and gas flow, chamber pressure, power level and endpoint. Configured for two process gases and nitrogen. Advanced Energy RFX 600 13.56 MHz, 600W RF generator. Single 8 in. x 13 in. electrode shelf set. Includes vacuum pump.     Inventory#: 58174

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METROLINE/IPC  7102 -- $15,000

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Used  METROLINE/IPC  7102  Automatic Plasma Treatment and Cleaning System. Menu driven programming with multi-step features. Parallel plates electrodes mounted vertically. Total of four sets with a surface area of 13 in. H x 28 in. D and a spacing of 1 in. between plates. Two gas inputs controlled via MFC. PE-2500 RF generator. Includes vacuum pump.     Inventory#: 56528

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OXFORD  80 PLUS RIE -- $59,000

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Used  OXFORD  80 PLUS RIE  Compact Plasma Reactive Ion Etching System RIE. The vacuum chamber is configured for optimal gas conductance at the wafer thus maximizing etch rate and uniformity. All parameters controlled via front panel display. 9 in. dia. platen. Previously used with four MFC and gases used were CF4, O2, CHF3, AR. Does not have turbo pump option installed. Includes vacuum pump. 208V, 3 Ph, 60 Hz.     Inventory#: 57562

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OXFORD  PLASMALAB 80 Plus -- $75,000

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Used  OXFORD  PLASMALAB 80 Plus  Turbopumped Reactive Ion Etch RIE System. PC controller with graphical user interface. Excellent across chamber uniformity. 500W, 13.56 MHz RF generator. Turbopumped chamber, includes roughing pump. Four gas inputs controlled via MFC. Previous gas used SF, O2, CHF3, N2. Shower head gas delivery method.     Inventory#: 55693

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OXFORD  PLASMALAB 80 Plus PLC -- $-

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Used  OXFORD  PLASMALAB 80 Plus PLC  Plasma System. More information to come contact us for details.      Inventory#: 56371

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OXFORD INSTRUMENTS  PLASMALAB SYSTEM 100 -- $75,000

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Used  OXFORD INSTRUMENTS  PLASMALAB SYSTEM 100  Load Locked RIE Reactive Ion Etching System. System controlled and monitored by PC. Turbo pumped load lock. 8 in. dia. bottom electrode. Shower head style gas delivery. Advanced Energy RFX-600A 13.56 MHz 600W RF generator. Turbo pump on the load lock and one on the process chamber. Includes roughing pump.     Inventory#: 56082

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* = Warranty terms only apply to non "as-is" items. "As-Is" items will have different return and warranty conditions. Contact us for details.

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