Plasma Etchers - Ashers - Ion Mills
Used Plasma Etchers - Ashers - Ion Mills

Refurbished with a 30 Day Right of Return and 3-Month Warranty! (Unless sold "AS-IS" * )

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Used  ANATECH  SP-150  Quartz Barrel Planar Descum Plasma System. Quartz Chamber: 10 in. dia. x 18 in. L. Planar electrode: 8 in. x 14 in. 300W, 13.56 MHz RF Generator. Includes vacuum pump.     Inventory#: 51906

Used  BAL-TEC  RES-010   Benchtop Rapid Etching System. Dual ion guns. Turbo and roughing pumps. Microscope for viewing sample. Etching process monitor.     Inventory#: 33840

Used  BRANSON/IPC  3000  Low Temperature Asher/Etcher. Quartz process chamber 10 in. dia. x 20 in. deep. PM-112 13.56 MHz RF Generator. With corrosive series vacuum pump.     Inventory#: 41378

Used  BRANSON/IPC  S2005  Low Temperature Asher. Three gas inputs for three seperate processes or programs. PM119 500W, 13.56 MHz RF Generator. Quartz reaction chamber 10 in. dia. by 20 in. L. Corrosive Series vacuum pump.     Inventory#: 40633

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Used  BRANSON/IPC  S2005-11020  Plasma Etcher/Stripper. Single button initiates routine processing. Three gas inputs. Quartz process chamber: 10 in. dia. x 20 in. D. For batch wafer process. PM119 13.56 MHz RF Generator. Includes vacuum pump.     Inventory#: 55321

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Used  BRANSON/IPC  S2100-11220  Low Temperature Plasma Asher. 11 in. dia. quartz process chamber. PM112 1000W, 13.56 MHz RF generator. Auto or manual modes. Includes vacuum pump.     Inventory#: 51932

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Used  BRANSON/IPC  S2100-11220  Low Temperature Plasma Asher. Uses oxygen and plasma to etch organic films and residues. 3 program process controller. Quartz Process Chamber: 10 in. dia. x 20 in. 1000W 13.56 MHz RF Generator. Auto or manual operation modes. Includes vacuum pump.     Inventory#: 53894

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Used  BRANSON/IPC  S3100  Low Temperature Plasma Asher. System generates a low pressure, low temperature gaseous plasma. Plasma reactions such as ashing, etching and polymer surface modifications can be performed. 11 in. dia. x 19 in. quartz process chamber. PM112 13.56 MHz RF generator, 1000W. Includes vacuum pump.     Inventory#: 51912

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Used  DENTON VACUUM  PE-250 UN2  Tabletop Etcher/Asher. Designed to handle a broad range of etching gases and processes. Manual matching network with 250W built-in RF power supply. Process Chamber: 7-1/2 in. dia. x 8 in. D. Includes vacuum pump.     Inventory#: 52917

Used  DIONEX  2000  Low Temperature Asher. Three process gas inputs. 10 in. dia. x 20 in. D quartz. PM 119 13.56 MHz 500W RF Generator. Corrosive series vacuum pump. Only one process control.     Inventory#: 39861

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Used  GASONICS  AURA 1000  Single Wafer Downstream Microwave Photoresist Stripper. Downstream microwave asher for high volume wafer fabrication. Cassette to cassette operation. Downstream processing helps eliminate wafer radiation damage. Front and backside access. Purge gas, 02 and N2 inputs. Process wafers up to 150 mm. Includes vacuum pump.     Inventory#: 54001

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Used  GASONICS  AURA 1000  Cassette to Cassette Downstream Microwave Asher. Single wafer downstream microwave photoresist stripper for high volume wafer fabrication. Downstream processing helps eliminate wafer radiation damage. Process the front and backside of wafers up to 150 mm. Multiple gas inputs. Includes vacuum pump.     Inventory#: 54002

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Used  GASONICS  AURA 1000  Single Wafer Downstream Microwave Photoresist Stripper. Downstream microwave asher for high volume wafer fabrication. Cassette to cassette operation. Downstream processing helps eliminate wafer radiation damage. Front and backside access. Purge gas, 02 and N2 inputs. Process wafers up to 150 mm. Includes vacuum pump.     Inventory#: 54007

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Used  GASONICS  AURA 1000  Single Wafer Downstream Microwave Photoresist Stripper. Downstream microwave asher for high volume wafer fabrication. Cassette to cassette operation. Downstream processing helps eliminate wafer radiation damage. Front and backside access. Purge gas, 02 and N2 inputs. Process wafers up to 150 mm. Includes vacuum pump.     Inventory#: 54044

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Used  GASONICS  L3510  Microwave Downstream Plasma Photoresist Removal System. Wide process window due to the patented large diameter microwave plasma source. Programmable heating and process controls contribute to the systems unparalled process flexibility. Wafer Capabilities: 75 to 200 mm. High throughput, excellent uniformity. Reliable endpoint detection.     Inventory#: 53246

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Used  GATAN  600 CTMP  Turbo Pumped Argon/Reactive Plasma DuoMill Dual Station Ion Milling System. Ion milling system for the preparation of high quality TEM specimens. Two independent milling stations mounted on a single high speed vacuum system. Each milling station has a Whisperlok specimen exchange system which functions without disturbing the vacuum or milling conditions of the other station and two Octogun ion guns.     Inventory#: 53783

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Used  GATAN  600 TMPA  Turbopumped DuoMill Dual Station Ion Milling System. Ion milling system for the preparation of high quality TEM specimens. Two independent milling stations mounted on a single high speed vacuum system. Each milling station has a WhisperlokTM specimen exchange system which functions without disturbing the vacuum or milling conditions of the other station and two Octogun ion guns.     Inventory#: 46714

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Used  GATAN  600A  Diffusion Pumped Dual Station Ion Milling System. Ion milling system for the preparation of high quality TEM specimens. Two independent milling stations mounted on a single high speed vacuum system. Each milling station has a Whisperlok™ specimen exchange system which functions without disturbing the vacuum or milling conditions of the other station and two Octogun™ ion guns.     Inventory#: 53356

Used  HYPERVISION  CHIP UNZIP  Backside Preparation System. Low stress backside preparation system is useful for the development and analysis of flip-chips, lead-on-chips packaging and advanced chip design with more than 3 metallization layers. Software controlled milling to remove semiconductor packaging materials: epoxy molding compound, ceramic, metal and perform backside thinning on silicon die.     Inventory#: 48882

Used  LAM  AUTOTECH 590  6 in. Oxide Etcher. Fully automated microprocessor operation. Programmable variable electrode spacing. Easy to read CRT monitoring. Cassette to cassette. Was used with 6 in. wafers. 1250W, 13.56 MHz RF Generator. Includes roughing pump.     Inventory#: 50513