Developers - Wet Process
Used Developers - Wet Process

Refurbished with a 30 Day Right of Return and 3-Month Warranty! (Unless sold "AS-IS" * )

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Used  AIR CONTROL  FH-45D-S-SS-6  Stainless Wet Station with Ultrasonic Bath. Overall Dimensions: 82 in. L x 45 in. W x 77 in. H. 1 Bath: 10 in. L x x 10 in. W x 12 in. H. 1 Ultrasonic Bath: 10 in. L x 14 in. W x 7 in. H. 1 Sink: 20 in. L x 23 in. W x 12 in. H. 120V, 60 Hz and 208V, 60 Hz.     Inventory#: 53642

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Used  AMERIMADE TECHNOLOGY  10FT-WPS-FM4910  4 Station BOE System with Robot Transfers in each Enclosed Station. Touch screen recipe driven control for each of the 4 modules. Lift/Transfer robot in each module for two 6 in. wafer cassettes. Each module contains one 17 in. L x 9 in. W x 9 in. H quick dump rinse and one 16 in. L x 8 in. W x 11 in. H temperature controlled bath with pneumatic lid. Includes external temperature system. Overall Dimensions: 119 in. L x 70 in. W x 84 in. H. Constructed of FM 4910 protocol fire retardant materials. Previously used as buffered oxide etch system.      Inventory#: 50976

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Used  AMERIMADE TECHNOLOGY  8FT-WPS-FM4910  3 Station Automated Wet Process System. Touch screen recipe driven control for each of the 3 modules. Lift/Transfer robot in each module. Holds two 6 in. wafer cassettes. First and second modules contain a 17 in. L x 9 in. W x 9 in. H quick dump rinse and a 16 in. L x 8 in. W x 11 in. H temperature bath. External temperature controller (2 baths in each module). Third module contains a 17 in. L x 9 in. W x 9 in. H QDR, an 8 in. L x 17 in. W x 11 in. H bath, 16 in. L x 8 in. W x 10 in. H quartz bath. Constructed of FM 4910 protocol fire retardant material. Overall Dimensions: 95 in. L x 70 in. W x 84 in. H. Previously used for metal/TiW etch station.     Inventory#: 50980

Used  APT  924  Emulsion Processor. Applications: Complete processing of silver halide emulsions. Both normal and reversal. Controller: Keyboard command controller. Spin speeds 100 to 2000 RPM +/-5 percent in nine increments. Process Mechanism: Dispensing systems for 2 developers, bleach, fixer, wetting agent and DI water. 110V, 50/60 Hz.      Inventory#: 31341

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Used  BETTCHER  48FRPPPA  Chemical Process Wet Bench. System has robot transfers for baths but no cassette holder. 2 - Quick Dump Rinse: 10 in. L x 11 in. W x 10-1/2 in. H. Bath: 12 in. L x 11 in. W x 11 in. H. Cascade Bath: 11 in. L x 11 in. W x 10 in. H. 220V, 1 Ph, 60 Hz.     Inventory#: 52642

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Used  BOLD TECHNOLOGIES  BATCH DEVELOPER  Batch Developer Wet Bench with Robot Transfer. Previously processed cassettes of 6 in. wafers. System has 2 robot transfer arms. Each arm transfers a single cassette of 6 in. wafers from a temperature controlled bath to a quick dump rinse bath. Bath temperature controlled by an external chiller. Overall Dimensions: 61 in. L x 63 in. W x 77 in. H.     Inventory#: 52333

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Used  BOLD TECHNOLOGIES  WET BENCH  Develop System with Robot Transfer. Previously used for 6 in. wafers. System has 2 robot transfer arms. Each arm transfers a single cassette of 6 in. wafers from a quick dump rinse bath to a temperature controlled bath. Bath temperature controlled by external chiller. Overall Bench Dimensions: 61 in. L x 55 in. W x 79 in. H.     Inventory#: 52290

Used  E3 SYSTEMS  WET BENCH  Automated cassette transfer arm. One quick rinse/dump tank 13-1/2 in. L x 7-1/2 in. W x 8-1/2 in. D. One temperature tank with external chiller/heater 16 in. L x 8-1/2 in. W x 8-1/2 in. D. Overall Dimensions: 48 in. L x 44 in. W x 79 in. D.     Inventory#: 36890

Used  INTERLAB  MRS  Ultrasonic Rinse Station. 2 Ultrasonic Tanks: 7 in. W x 9.5 in. L x 7.5 in. D. Stainless steel construction. 2 Quartz Timers. Flow Hood Not Included.     Inventory#: 25207

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Used  LECHLER  Ultrasonic Cone Nozzles  Ultrasonic Cone Nozzles. 0950090008600/0950090007630. Total of 8 units available. $1,250.00/each unit. 50 kHz, 5W power supply with 1 cone shaped dispense nozzle. 2 - 110V. 6 - 220V.      Inventory#: 54518

Used  MTI  FLEXIFAB  Automated Developer. Robot arm removes wafer from cassette and transfers it to the spin developer module. All process are controlled via touch screen monitor. Currently configured for 6 in. wafers. No develop tanks with system.     Inventory#: 50568

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Used  MTI  FLEXIFAB  Develop Track with Brush Cleaner Module. MTI modular track system with a dual dispense develop module, bake module, cassette robot module, control module and a wafer brush cleaner module. Last used for 6 in. wafers.     Inventory#: 52574

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Used  MTI  FLEXIFAB  Photoresist Track System Modules. 2 - Photoresist spinner Modules. 1 - Bake Module. 1 - Elevator Module. 1 - Control Module. PARTS ONLY.     Inventory#: 52624

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Used  MTS  WET BENCH  PC controller with touch screen interface. 2 - Heated Quartz Cascade Tanks: 16 in. L x 8 in. W x 9 in. H. Quick Dump Rinse: 16 in. L x 8 in. W x 8 in. H. Overall Dimensions: 51 in. L x 65 in. W x 80 in. H. 208V, 3 Ph, 60 Hz. Constructed of FM 4910 protocol fire retardant materials.     Inventory#: 51367

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Used  MTS  WET BENCH  PC controller with touch screen interface. 2 Quartz Cascade Tanks: 16 in. L x 8 in. W x 9 in. H. Quick Dump Rinser: 16 in. L x 8 in. W x 8 in. H. Constructed of FM 4910 protocol fire retardant materials. Mfg. 12/2005. Previously used in 6 in. wafer fab.     Inventory#: 50973

Used  NOAH PRECISION  WET BENCH  Wet Bench with 270S Rinser/Dryer. STI 270S rinser dryer with PSC-101 controller, currently configured for 4 in. cassette. Quick Dump Rinse: 10 in. L x 7 in. W x 8 in. H. Heated Quartz Bath (no drain, NEW never used): 11 in. L x 7 in. W x 8 in. H. Magnehelic exhaust monitor. Overall Dimensions: 55 in. L x 34 in. W x 69 in. H.      Inventory#: 49756

Used  POLYFLOW  S-1050  PCB911 RTP Parts Cleaner. System looks like it was never used, Mfg. date March 1998. Three Tanks: 24 in. L x 14 in. W x 12 in. H. Air actuated tank lids. UV-IR flame detector. Acid reclaim tanks. Overall Dimensions: 103 in. L x 60 in. W x 88 in. H.      Inventory#: 46315

Used  POLYFLOW  S-1052  SNK921 Generic UPW Rinse Station. Looks like system was never used, Mfg. Date 1998. Acid reclaim tank. Single 36 in. L x 24 in. W x 14 in. H Tank with air actuated lid. Overall Dimensions: 61 in. L x 61 in. W x 88 in. H.      Inventory#: 46318

Used  POLYFLOW  S-955-N12  Horizontal Preform Cleaner. Rotating fixture: 8 in. dia. x 48 in. L. 4 acid storage tanks under unit. For cleaning paddles or quartz rods or other small parts.     Inventory#: 41231

Used  SC FLUIDS  CPD1100  Supercritical CO2 Dryer For Advanced Integrated Circuits and MEMS. Uses liquid and supercritical carbon dioxide to dry MEMS wafers efficiently and with high yield. Due to zero surface tension in the supercritical state of the CO2, stiction, the most critical negative yield factor, in MEMS production, is avoided completely. Features an ultra-clean CO2 delivery system to avoid particle contamination of the wafer. Fluid separator on the exhaust side collects the process solvent for easy disposal. Single wafer stand-alone tool. PLC process controller. Stores up to ten process recipes.     Inventory#: 41902